XCEED: XTREME commercial EUV exposure diagnostic experiment

Keyphrases

• Optics 100%
• Ultraviolet Exposure 100%
• Extreme Ultraviolet 100%
• Debris 66%
• Exposure Test 66%
• Ion Debris 66%
• Z-pinch 66%
• Energy Distribution 33%
• Ejection 33%
• Heavy Ions 33%
• Photodiode 33%
• Exposure Time 33%
• Light Emission 33%
• Xenon 33%
• Ion Species 33%
• Deposition Effect 33%
• Angular Distribution 33%
• Plasma Sources 33%
• Mirror Surface 33%
• Ejecta 33%
• Surface Metrology 33%
• Extreme Ultraviolet Source 33%
• Particle Flux 33%
• Discharge Produced Plasma 33%
• Erosive Effect 33%
• Mirror Sample 33%
• Charge Ratio 33%
• Faraday Cup 33%
• Extreme Ultraviolet Emission 33%
• Total Particles 33%
• Energy Analyzer 33%
• Erosion Effect 33%
• Time-of-flight Analysis 33%
• Source Plasma 33%
• Multiply Charged Ions 33%
• UV Photodiode 33%
• Reflection Angle 33%
• Grazing Incidence Reflection 33%

Engineering

• Photodiode 100%
• Time-of-Flight 100%
• Plasma Source 100%
• Surface Source 50%
• Light Source 50%
• Energy Distribution 50%
• Ultraviolet Light 50%
• Angular Distribution 50%
• Exposure Time 50%
• Particle Flux 50%
• Light Emission 50%

Physics

• Optics 100%
• Photodiode 66%
• Blood Plasma 66%
• Flux (Rate) 33%
• Light Emission 33%
• Light Source 33%
• Grazing Incidence 33%
• Angular Distribution 33%
• Energy Distribution 33%
• Ejecta 33%
• Ultraviolet Emission 33%