White-light interferometric microscopy for wafer defect inspection

Renjie Zhou, Christopher Edwards, Casey Bryniarski, Marjorie F. Dallmann, Gabriel Popescu, Lynford L. Goddard

Research output: Chapter in Book/Report/Conference proceedingConference contribution


White-light imaging systems are free of laser-speckle. Thus, they offer high sensitivity for optical defect metrology, especially when used with interferometry based quantitative phase imaging. This can be a potential solution for wafer inspection beyond the 9 nm node. Recently, we built a white-light epi-illumination diffraction phase microscopy (epi-wDPM) for wafer defect inspection. The system is also equipped with an XYZ scanning stage and real-time processing. Preliminary results have demonstrated detection of 15 nm by 90 nm in a 9 nm node densely patterned wafer with bright-field imaging. Currently, we are implementing phase imaging with epi-wDPM for additional sensitivity.

Original languageEnglish (US)
Title of host publicationQuantitative Phase Imaging
EditorsYongKeun Park, Gabriel Popescu
ISBN (Electronic)9781628414264
StatePublished - 2015
Event1st Conference on Quantitative Phase Imaging, QPI 2015 - San Francisco, United States
Duration: Feb 7 2015Feb 10 2015

Publication series

NameProgress in Biomedical Optics and Imaging - Proceedings of SPIE
ISSN (Print)1605-7422


Other1st Conference on Quantitative Phase Imaging, QPI 2015
Country/TerritoryUnited States
CitySan Francisco


  • Wafer defect inspection
  • image post-processing
  • interferometric microscopy
  • quantitative phase imaging
  • white-light defect inspection

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Radiology Nuclear Medicine and imaging
  • Biomaterials


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