Vertically stacked individually tunable nanowire field effect transistors for low power operation with ultrahigh radio frequency linearity

Yi Song, Jun Luo, Xiuling Li

Research output: Contribution to journalArticle

Abstract

In this letter, we present an experimentally feasible design of vertically stacked nanowire (NW) gate-all-around (GAA) metal-oxide-semiconductor field effect transistors (MOSFETs) for operation in radio-frequency (RF) circuits with ultrahigh linearity. We demonstrate that by properly tuning the diameters and doping levels of individual NWs in the vertical stack, a much higher third order intercept point is achieved compared to single nanowire designs, without degrading other performance metrics. This methodology for improving linearity overcomes the design tradeoff between RF linearity and power supply, and should be applicable to multi-stack nanowire GAA MOSFETs of all materials.

Original languageEnglish (US)
Article number093509
JournalApplied Physics Letters
Volume101
Issue number9
DOIs
StatePublished - Aug 27 2012

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ultrahigh frequencies
linearity
radio frequencies
nanowires
field effect transistors
metal oxide semiconductors
tradeoffs
power supplies
tuning
methodology

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Vertically stacked individually tunable nanowire field effect transistors for low power operation with ultrahigh radio frequency linearity. / Song, Yi; Luo, Jun; Li, Xiuling.

In: Applied Physics Letters, Vol. 101, No. 9, 093509, 27.08.2012.

Research output: Contribution to journalArticle

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