Vertically scaled MOSFET gate stacks and junctions: How far are we likely to go?
Carlton M. Osburn, Indong Kim, Sungkee Han, Indranil De, Kam F. Yee, Shyam Gannavaram, Sung Joo Lee, Chung Ho Lee, Zhijiong J. Luo, Wenjuan Zhu, John R. Hauser, Dim Lee Kwong, Gerald Lucovsky, T. P. Ma, Mehmet C. Öztürk
Research output: Contribution to journal › Review article › peer-review
Fingerprint
Dive into the research topics of 'Vertically scaled MOSFET gate stacks and junctions: How far are we likely to go?'. Together they form a unique fingerprint.