Vertically scaled MOSFET gate stacks and junctions: How far are we likely to go?

Carlton M. Osburn, Indong Kim, Sungkee Han, Indranil De, Kam F. Yee, Shyam Gannavaram, Sung Joo Lee, Chung Ho Lee, Zhijiong J. Luo, Wenjuan Zhu, John R. Hauser, Dim Lee Kwong, Gerald Lucovsky, T. P. Ma, Mehmet C. Öztürk

Research output: Contribution to journalReview article

Fingerprint Dive into the research topics of 'Vertically scaled MOSFET gate stacks and junctions: How far are we likely to go?'. Together they form a unique fingerprint.

Engineering & Materials Science