Unraveling atomic-level self-organization at the plasma-material interface

J. P. Allain, A. Shetty

Research output: Contribution to journalReview article

Abstract

The intrinsic dynamic interactions at the plasma-material interface and critical role of irradiation-driven mechanisms at the atomic scale during exposure to energetic particles require a priori the use of in situ surface characterization techniques. Characterization of 'active' surfaces during modification at atomic-scale levels is becoming more important as advances in processing modalities are limited by an understanding of the behavior of these surfaces under realistic environmental conditions. Self-organization from exposure to non-equilibrium and thermalized plasmas enable dramatic control of surface morphology, topography, composition, chemistry and structure yielding the ability to tune material properties with an unprecedented level of control. Deciphering self-organization mechanisms of nanoscale morphology (e.g. nanodots, ripples) and composition on a variety of materials including: compound semiconductors, semiconductors, ceramics, polymers and polycrystalline metals via low-energy ion-beam assisted plasma irradiation are critical to manipulate functionality in nanostructured systems. By operating at ultra-low energies near the damage threshold, irradiation-driven defect engineering can be optimized and surface-driven mechanisms controlled. Tunability of optical, electronic, magnetic and bioactive properties is realized by reaching metastable phases controlled by atomic-scale irradiation-driven mechanisms elucidated by novel in situ diagnosis coupled to atomistic-level computational tools. Emphasis will be made on tailored surface modification from plasma-enhanced environments on particle-surface interactions and their subsequent modification of hard and soft matter interfaces. In this review, we examine current trends towards in situ and in operando surface and sub-surface characterization to unravel atomic-scale mechanisms at the plasma-material interface. This work will emphasize on recent advances in the field of plasma and ion-induced nanopatterning and nanostructuring as well as ultra-thin film deposition. Future outlook will examine the critical role of complementary surface-sensitive techniques and trends towards advances in both in situ and in operando tooling.

Original languageEnglish (US)
Article number283002
JournalJournal of Physics D: Applied Physics
Volume50
Issue number28
DOIs
StatePublished - Jun 28 2017

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Keywords

  • fusion plasma
  • in situ surface characterization
  • ion-induced nanopatterning
  • nanoscale morphology
  • plasma-material interface
  • self-organized nanostructures

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

Cite this

Unraveling atomic-level self-organization at the plasma-material interface. / Allain, J. P.; Shetty, A.

In: Journal of Physics D: Applied Physics, Vol. 50, No. 28, 283002, 28.06.2017.

Research output: Contribution to journalReview article

Allain, J. P.; Shetty, A. / Unraveling atomic-level self-organization at the plasma-material interface.

In: Journal of Physics D: Applied Physics, Vol. 50, No. 28, 283002, 28.06.2017.

Research output: Contribution to journalReview article

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