Unlocking MicroLED Potential: Damage-free Anisotropic Etching for Enhanced Pixel Density

Clarence Y. Chan, Henry C. Roberts, Yixin Xiao, Zetian Mi, Xiuling Li

Research output: Contribution to conferencePaperpeer-review

Abstract

One of the biggest hurdles in microLED-technology is the efficiency degradation with shrinking pixel-size, due to etching damage. We present the scaling of µLED from 45 to 5 µm by MacEtch, with near size-independent EQE.

Original languageEnglish (US)
StatePublished - 2024
Externally publishedYes
EventCLEO: Applications and Technology in CLEO 2024, CLEO: A and T 2024 - Part of Conference on Lasers and Electro-Optics - Charlotte, United States
Duration: May 5 2024May 10 2024

Conference

ConferenceCLEO: Applications and Technology in CLEO 2024, CLEO: A and T 2024 - Part of Conference on Lasers and Electro-Optics
Country/TerritoryUnited States
CityCharlotte
Period5/5/245/10/24

ASJC Scopus subject areas

  • General Computer Science
  • Space and Planetary Science
  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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