Uniformity-Aware standard cell design with accurate shape control

Keyphrases

• Cell Design 100%
• Shape Control 100%
• 22 Nm Node 100%
• Printability 100%
• Standard Cell Design 100%
• Resolution Enhancement Technology 100%
• Double Patterning Technology 100%
• Cell-based 50%
• Light Source 50%
• Design Methodology 50%
• Downscaling 50%
• Large Gap 50%
• Printing Technology 50%
• Design Phase 50%
• 2D Structure 50%
• Major Change 50%
• Circuit Design 50%
• Manufacturability 50%
• Line Ends 50%
• Design Level 50%
• Size Resolution 50%
• Delta Cell 50%
• Processing Node 50%
• Layout Pattern 50%
• VLSI Technology 50%
• Gap Distribution 50%
• Off-axis Illumination 50%
• Line Printing 50%
• End Gap 50%
• Light Refraction 50%
• Lithography Friendly Design 50%

Engineering

• Nodes 100%
• Cell Design 100%
• Light Source 33%
• Feature Size 33%
• Design Phase 33%
• Major Change 33%
• Manufacturability 33%
• Circuit Design 33%

Material Science

• Electronic Circuit 100%