Understanding the ion beam in EUV mask blank production

Patrick Kearney, Vibhu Jindal, Alfred Weaver, Pat Teora, John Sporre, David N Ruzic, Frank Goodwin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Fingerprint Dive into the research topics of 'Understanding the ion beam in EUV mask blank production'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy