Unconventional methods for forming nanopatterns

M. E. Stewart, M. J. Motala, L. B. Thompson, Jimin Yao, R. G. Nuzzo

Research output: Contribution to journalArticle

Abstract

Nanostructured materials have become an increasingly important theme in research, in no small part due to the potential impacts this science holds for applications in technology, including such notable areas as sensors, medicine, and high-performance integrated circuits. Conventional methods, such as the top-down approaches of projection lithography and scanning beam lithography, have been the primary means for patterning materials at the nanoscale. This article provides an overview of unconventional methods - both top-down and bottom-up approaches - for generating nanoscale patterns in a variety of materials, including methods that can be applied to fragile molecular systems that are difficult to pattern using conventional lithographic techniques. The promise, recent progress, advantages, limitations, and challenges to future development associated with each of these unconventional lithographic techniques will be discussed with consideration given to their potential for use in large-scale manufacturing.

Original languageEnglish (US)
Pages (from-to)81-138
Number of pages58
JournalProceedings of the Institution of Mechanical Engineers, Part N: Journal of Nanoengineering and Nanosystems
Volume220
Issue number3
DOIs
StatePublished - Sep 1 2006

Keywords

  • imprint-
  • near-field-
  • scanning probe lithography
  • self assembly
  • soft-

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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