Ultraviolet emission from OH and ArD in microcavity plasma devices

B. J. Ricconi; S. J. Park; S. H. Sung; P. A. Tchertchian; J. G. Eden

doi:10.1049/el:20071673

Ultraviolet emission from OH and ArD in microcavity plasma devices

B. J. Ricconi, S. J. Park, S. H. Sung, P. A. Tchertchian, J. G. Eden

Electrical and Computer Engineering

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Abstract

Intense emission in the ultraviolet (250-400nm) from OH (A ²Σ⁺) and the rare gas-deuteride excimer ArD has been observed from mixtures of H₂O vapour or D₂ in Ar and excited in microcavity plasma devices. Peak wavelength-integrated intensities are measured for H₂O and D₂ concentrations of ∼0.16 and 0.5-1, respectively. Spectral simulations indicate the OH (A ²Σ⁺, v^′=0) rotational temperature to be 440±20K for 600 Torr Ar/0.3 Torr H₂O mixtures excited in a 45nL microcavity.

Original language	English (US)
Pages (from-to)	1194-1196
Number of pages	3
Journal	Electronics Letters
Volume	43
Issue number	22
DOIs	https://doi.org/10.1049/el:20071673
State	Published - 2007

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Electrical and Electronic Engineering

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10.1049/el:20071673

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title = "Ultraviolet emission from OH and ArD in microcavity plasma devices",

abstract = "Intense emission in the ultraviolet (250-400nm) from OH (A 2Σ+) and the rare gas-deuteride excimer ArD has been observed from mixtures of H2O vapour or D2 in Ar and excited in microcavity plasma devices. Peak wavelength-integrated intensities are measured for H2O and D2 concentrations of ∼0.16 and 0.5-1, respectively. Spectral simulations indicate the OH (A 2Σ+, v′=0) rotational temperature to be 440±20K for 600 Torr Ar/0.3 Torr H2O mixtures excited in a 45nL microcavity.",

author = "Ricconi, \{B. J.\} and Park, \{S. J.\} and Sung, \{S. H.\} and Tchertchian, \{P. A.\} and Eden, \{J. G.\}",

year = "2007",

doi = "10.1049/el:20071673",

language = "English (US)",

volume = "43",

pages = "1194--1196",

journal = "Electronics Letters",

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publisher = "John Wiley \& Sons, Ltd.",

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TY - JOUR

T1 - Ultraviolet emission from OH and ArD in microcavity plasma devices

AU - Ricconi, B. J.

AU - Park, S. J.

AU - Sung, S. H.

AU - Tchertchian, P. A.

AU - Eden, J. G.

PY - 2007

Y1 - 2007

N2 - Intense emission in the ultraviolet (250-400nm) from OH (A 2Σ+) and the rare gas-deuteride excimer ArD has been observed from mixtures of H2O vapour or D2 in Ar and excited in microcavity plasma devices. Peak wavelength-integrated intensities are measured for H2O and D2 concentrations of ∼0.16 and 0.5-1, respectively. Spectral simulations indicate the OH (A 2Σ+, v′=0) rotational temperature to be 440±20K for 600 Torr Ar/0.3 Torr H2O mixtures excited in a 45nL microcavity.

AB - Intense emission in the ultraviolet (250-400nm) from OH (A 2Σ+) and the rare gas-deuteride excimer ArD has been observed from mixtures of H2O vapour or D2 in Ar and excited in microcavity plasma devices. Peak wavelength-integrated intensities are measured for H2O and D2 concentrations of ∼0.16 and 0.5-1, respectively. Spectral simulations indicate the OH (A 2Σ+, v′=0) rotational temperature to be 440±20K for 600 Torr Ar/0.3 Torr H2O mixtures excited in a 45nL microcavity.

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DO - 10.1049/el:20071673

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SN - 0013-5194

VL - 43

SP - 1194

EP - 1196

JO - Electronics Letters

JF - Electronics Letters

IS - 22

ER -

Ultraviolet emission from OH and ArD in microcavity plasma devices

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