Ultraviolet emission from OH and ArD in microcavity plasma devices

B. J. Ricconi, S. J. Park, S. H. Sung, P. A. Tchertchian, James Gary Eden

Research output: Contribution to journalArticle

Abstract

Intense emission in the ultraviolet (250-400nm) from OH (A 2Σ+) and the rare gas-deuteride excimer ArD has been observed from mixtures of H2O vapour or D2 in Ar and excited in microcavity plasma devices. Peak wavelength-integrated intensities are measured for H2O and D2 concentrations of ∼0.16 and 0.5-1, respectively. Spectral simulations indicate the OH (A 2Σ+, v=0) rotational temperature to be 440±20K for 600 Torr Ar/0.3 Torr H2O mixtures excited in a 45nL microcavity.

Original languageEnglish (US)
Pages (from-to)1194-1196
Number of pages3
JournalElectronics Letters
Volume43
Issue number22
DOIs
StatePublished - Oct 30 2007

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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    Ricconi, B. J., Park, S. J., Sung, S. H., Tchertchian, P. A., & Eden, J. G. (2007). Ultraviolet emission from OH and ArD in microcavity plasma devices. Electronics Letters, 43(22), 1194-1196. https://doi.org/10.1049/el:20071673