Abstract
A method of making a semiconductor structure includes contacting a surface of a semiconductor with a liquid including Zr4(OPrn)16 to form a modified surface, activating the modified surface, and repeating the contacting and activating to form a layer of zirconia on the semiconductor surface.
| Original language | English (US) |
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| U.S. patent number | 6794315 |
| Filing date | 3/6/03 |
| State | Published - Sep 21 2004 |