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Ultrathin oxide films by atomic layer deposition on graphene
Luda Wang
, Jonathan J. Travis
, Andrew S. Cavanagh
, Xinghui Liu
, Steven P. Koenig
,
Pinshane Y. Huang
, Steven M. George
, J. Scott Bunch
Research output
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peer-review
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Keyphrases
Atomic Layer Deposition
100%
Graphene
100%
Ultrathin Oxide Films
100%
Ultrathin Films
50%
Young's Modulus
50%
Aluminum Oxide Film
50%
Aluminum Oxide
25%
Flexible Electronics
25%
Nanometer Scale
25%
Ultrathin
25%
Pinhole-free
25%
Thin Film Coating
25%
Mechanical Integrity
25%
Pure Aluminum
25%
Mechanical Robustness
25%
Scale Thickness
25%
Pressurized Blister Test
25%
Standard Gas
25%
Suspended Graphene Membranes
25%
Two-dimensional Films
25%
Material Science
Graphene
100%
Oxide Film
100%
Aluminum Oxide
75%
Film
50%
Young's Modulus
50%
Ultrathin Film
50%
Film Deposition
25%
Thin Film Coating
25%