Ultrasmooth cobalt films on SiO₂by chemical vapor deposition using a nucleation promoter and a growth inhibitor

Physics & Astronomy

• inhibitors 82%
• cobalt 65%
• vapor deposition 54%
• nucleation 52%
• pretreatment 46%
• surface roughness 35%
• ammonia 28%
• metals 14%
• atoms 14%
• coalescing 13%
• roughness 11%
• nuclei 9%
• thin films 7%
• gases 7%

Engineering & Materials Science

• Chemical vapor deposition 82%
• Cobalt 81%
• Nucleation 73%
• Surface roughness 46%
• Atoms 29%
• Metal complexes 22%
• Coalescence 16%
• Thin films 13%
• Metals 9%
• Gases 8%

Chemical Compounds

• Growth Inhibitor 100%
• Chemical Vapour Deposition 63%
• Nucleation 58%
• Surface Roughness 42%
• Liquid Film 34%
• Ammonia 21%
• Surface 17%
• Metal 6%