Ultrahigh vacuum scanning tunneling microscope-based nanolithography and selective chemistry on silicon surfaces

Joseph W Lyding, T. C. Shen, G. C. Abeln, C. Wang, Paul Scott Carney, J. R. Tucker, Ph Avouris, R. E. Walkup

Research output: Contribution to journalArticle

Abstract

Nanofabrication on silicon surfaces has been achieved in a manner similar to e-beam/resist technology, in which hydrogen serves as a monolayer resist for exposure by the electron beam from an ultrahigh vacuum (UHV) scanning tunneling microscope (STM). In this scheme, hydrogen is selectively desorbed from Si(100)2×1:H surfaces that have been prepared by atomic hydrogen dosing under UHV background conditions. To remove hydrogen, the tip bias is raised, under feedback control, and then the desired pattern is drawn. Two regimes of hydrogen desorption are observed: at higher energies, above ∼6.0 V, direct electron-stimulated desorption occurs, whereas at lower biases, desorption occurs via a multiple excitation vibrational heating mechanism and exhibits a strong current dependence. Patterning linewidth down to a single dimer row has been achieved in the vibrational heating regime. The selective removal of hydrogen suggests many possibilities for subsequent chemical treatments in which the hydrogen-terminated silicon remains inert. We have performed experiments which demonstrate selective oxidation of, and nitrogen incorporation into, the STM-patterned regions.

Original languageEnglish (US)
Pages (from-to)3-10
Number of pages8
JournalIsrael Journal of Chemistry
Volume36
Issue number1
DOIs
StatePublished - Jan 1 1996

Fingerprint

Nanolithography
Ultrahigh vacuum
Silicon
Hydrogen
Microscopes
Scanning
Desorption
Heating
Nanotechnology
Linewidth
Dimers
Feedback control
Electron beams
Monolayers
Nitrogen
Oxidation
Electrons

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Ultrahigh vacuum scanning tunneling microscope-based nanolithography and selective chemistry on silicon surfaces. / Lyding, Joseph W; Shen, T. C.; Abeln, G. C.; Wang, C.; Carney, Paul Scott; Tucker, J. R.; Avouris, Ph; Walkup, R. E.

In: Israel Journal of Chemistry, Vol. 36, No. 1, 01.01.1996, p. 3-10.

Research output: Contribution to journalArticle

Lyding, Joseph W ; Shen, T. C. ; Abeln, G. C. ; Wang, C. ; Carney, Paul Scott ; Tucker, J. R. ; Avouris, Ph ; Walkup, R. E. / Ultrahigh vacuum scanning tunneling microscope-based nanolithography and selective chemistry on silicon surfaces. In: Israel Journal of Chemistry. 1996 ; Vol. 36, No. 1. pp. 3-10.
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