Ultrafast three-dimensional microscopy of laser photothermal imaging materials

Hyunung Yu, F. Richard Kearney, Dana D Dlott

Research output: Contribution to journalConference articlepeer-review

Abstract

Time-resolved microscopy in a variety of configurations is used for three-dimensional imaging of laser photothermal materials used in offset lithographic computer-to-plate printing applications. Materials having an ink-repelling silicone layer and either a metallic absorbing layer or an energetic absorbing layer are studied. The energetic layers result in lower exposure thresholds when 10 microsecond and 2 microsecond duration near-IR laser pulses are used. The images explain the mechanism of threshold lowering, as a result of hot gas from the energetic layer causing the silicone layer to balloon. The expanding balloon results in less laser energy needed to produce an exposed spot.

Original languageEnglish (US)
Article number247
Pages (from-to)24-33
Number of pages10
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5580
DOIs
StatePublished - Aug 16 2005
Event26th International Congress on High-Speed Photography and Photonics - Alexandria, VA, United States
Duration: Sep 20 2004Sep 24 2004

Keywords

  • Laser ablation
  • Lithographic printing
  • Microscopy
  • Photothermal imaging
  • Time-resolved imaging

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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