Ultra-low threshold laser ablation investigated by time-resolved microscopy

Research output: Contribution to journalConference articlepeer-review


Laser ablation materials are described that can be exposed using inexpensive near-IR lasers such as laser diodes. These materials were designed to act as printing plates in offset lithographic printing presses. Studies of the fundamental mechanisms of laser ablation were conducted using pulse-duration-dependent time-resolved optical microscopy. A knowledge of these mechanisms was used to engineer advanced ablation materials. Addition of an energetic polymer underneath the ablation layer, and the use of stress-assisted ablation were two strategies employed to achieve ultra-low ablation thresholds of a few tens of mJ/cm2.

Original languageEnglish (US)
Pages (from-to)3-10
Number of pages8
JournalApplied Surface Science
StatePublished - 2002
EventCola 2001 - Tsukuba, Japan
Duration: Oct 1 2001Oct 1 2001


  • Computer-to-press imaging
  • Laser ablation
  • Laser photothermal imaging
  • Time-resolved microscopy
  • Titanium nitride

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics


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