UIUC collector erosion and optical lifetime project results: Time dependent exposures

Darren A. Alman; Huatan Qiu; Keith C. Thompson; Erik L. Antonsen; Joshua B. Spencer; Matthew R. Hendricks; Brian E. Jurczyk; David N Ruzic; Timothy Spila; Ginger Edwards; Stefan Wurm; Obert Wood; Robert Bristol

doi:10.1117/12.599978

UIUC collector erosion and optical lifetime project results: Time dependent exposures

Darren A. Alman, Huatan Qiu, Keith C. Thompson, Erik L. Antonsen, Joshua B. Spencer, Matthew R. Hendricks, Brian E. Jurczyk, David N Ruzic, Timothy Spila, Ginger Edwards, Stefan Wurm, Obert Wood, Robert Bristol

Research output: Contribution to journal › Conference article › peer-review

Abstract

Extreme ultraviolet (EUV) light sources are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector optics. Frequent replacement of the mirror system will detract from the economic feasibility of EUV lithography. The Xtreme Commercial EUV Exposure Device (XCEED) at the University of Illinois has been designed to test the performance of various EUV mirror materials during operation of a commercial EUV source, and to investigate the mechanisms behind observed losses in reflectivity over a varying number of shots. Recently, four Mo/Si multilayer mirror samples were exposed in XCEED for variable numbers of shots, up to 40 million. The samples were analyzed to determine how the surface roughness was effected and how much material was eroded vs. time. XCEED also includes photodiodes to measure light output and light reflected from mirror samples, as well as a time-of-flight energy sector analyzer (TOF-ESA) for debris characterization. The results of these time-dependent exposures are presented in this work.

Original language	English (US)
Article number	137
Pages (from-to)	1118-1124
Number of pages	7
Journal	Progress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume	5751
Issue number	II
DOIs	https://doi.org/10.1117/12.599978
State	Published - 2005
Event	Emerging Lithographic Technologies IX - San Jose, CA, United States Duration: Mar 1 2005 → Mar 3 2005

Keywords

Condenser Optics Lifetime
Damage Characterization
EUV Time Exposure

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Biomaterials
Atomic and Molecular Physics, and Optics
Radiology Nuclear Medicine and imaging

Online availability

10.1117/12.599978

Library availability

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Alman, D. A., Qiu, H., Thompson, K. C., Antonsen, E. L., Spencer, J. B., Hendricks, M. R., Jurczyk, B. E., Ruzic, D. N., Spila, T., Edwards, G., Wurm, S., Wood, O., & Bristol, R. (2005). UIUC collector erosion and optical lifetime project results: Time dependent exposures. Progress in Biomedical Optics and Imaging - Proceedings of SPIE, 5751(II), 1118-1124. Article 137. https://doi.org/10.1117/12.599978

Alman, DA, Qiu, H, Thompson, KC, Antonsen, EL, Spencer, JB, Hendricks, MR, Jurczyk, BE, Ruzic, DN, Spila, T, Edwards, G, Wurm, S, Wood, O & Bristol, R 2005, 'UIUC collector erosion and optical lifetime project results: Time dependent exposures', Progress in Biomedical Optics and Imaging - Proceedings of SPIE, vol. 5751, no. II, 137, pp. 1118-1124. https://doi.org/10.1117/12.599978

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abstract = "Extreme ultraviolet (EUV) light sources are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector optics. Frequent replacement of the mirror system will detract from the economic feasibility of EUV lithography. The Xtreme Commercial EUV Exposure Device (XCEED) at the University of Illinois has been designed to test the performance of various EUV mirror materials during operation of a commercial EUV source, and to investigate the mechanisms behind observed losses in reflectivity over a varying number of shots. Recently, four Mo/Si multilayer mirror samples were exposed in XCEED for variable numbers of shots, up to 40 million. The samples were analyzed to determine how the surface roughness was effected and how much material was eroded vs. time. XCEED also includes photodiodes to measure light output and light reflected from mirror samples, as well as a time-of-flight energy sector analyzer (TOF-ESA) for debris characterization. The results of these time-dependent exposures are presented in this work.",

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author = "Alman, {Darren A.} and Huatan Qiu and Thompson, {Keith C.} and Antonsen, {Erik L.} and Spencer, {Joshua B.} and Hendricks, {Matthew R.} and Jurczyk, {Brian E.} and Ruzic, {David N} and Timothy Spila and Ginger Edwards and Stefan Wurm and Obert Wood and Robert Bristol",

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doi = "10.1117/12.599978",

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AU - Alman, Darren A.

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AU - Spencer, Joshua B.

AU - Hendricks, Matthew R.

AU - Jurczyk, Brian E.

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AU - Spila, Timothy

AU - Edwards, Ginger

AU - Wurm, Stefan

AU - Wood, Obert

AU - Bristol, Robert

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N2 - Extreme ultraviolet (EUV) light sources are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector optics. Frequent replacement of the mirror system will detract from the economic feasibility of EUV lithography. The Xtreme Commercial EUV Exposure Device (XCEED) at the University of Illinois has been designed to test the performance of various EUV mirror materials during operation of a commercial EUV source, and to investigate the mechanisms behind observed losses in reflectivity over a varying number of shots. Recently, four Mo/Si multilayer mirror samples were exposed in XCEED for variable numbers of shots, up to 40 million. The samples were analyzed to determine how the surface roughness was effected and how much material was eroded vs. time. XCEED also includes photodiodes to measure light output and light reflected from mirror samples, as well as a time-of-flight energy sector analyzer (TOF-ESA) for debris characterization. The results of these time-dependent exposures are presented in this work.

AB - Extreme ultraviolet (EUV) light sources are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector optics. Frequent replacement of the mirror system will detract from the economic feasibility of EUV lithography. The Xtreme Commercial EUV Exposure Device (XCEED) at the University of Illinois has been designed to test the performance of various EUV mirror materials during operation of a commercial EUV source, and to investigate the mechanisms behind observed losses in reflectivity over a varying number of shots. Recently, four Mo/Si multilayer mirror samples were exposed in XCEED for variable numbers of shots, up to 40 million. The samples were analyzed to determine how the surface roughness was effected and how much material was eroded vs. time. XCEED also includes photodiodes to measure light output and light reflected from mirror samples, as well as a time-of-flight energy sector analyzer (TOF-ESA) for debris characterization. The results of these time-dependent exposures are presented in this work.

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UIUC collector erosion and optical lifetime project results: Time dependent exposures

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