UIUC collector erosion and optical lifetime project results: Time dependent exposures

Darren A. Alman, Huatan Qiu, Keith C. Thompson, Erik L. Antonsen, Joshua B. Spencer, Matthew R. Hendricks, Brian E. Jurczyk, David N Ruzic, Timothy Spila, Ginger Edwards, Stefan Wurm, Obert Wood, Robert Bristol

Research output: Contribution to journalConference article

Abstract

Extreme ultraviolet (EUV) light sources are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector optics. Frequent replacement of the mirror system will detract from the economic feasibility of EUV lithography. The Xtreme Commercial EUV Exposure Device (XCEED) at the University of Illinois has been designed to test the performance of various EUV mirror materials during operation of a commercial EUV source, and to investigate the mechanisms behind observed losses in reflectivity over a varying number of shots. Recently, four Mo/Si multilayer mirror samples were exposed in XCEED for variable numbers of shots, up to 40 million. The samples were analyzed to determine how the surface roughness was effected and how much material was eroded vs. time. XCEED also includes photodiodes to measure light output and light reflected from mirror samples, as well as a time-of-flight energy sector analyzer (TOF-ESA) for debris characterization. The results of these time-dependent exposures are presented in this work.

Original languageEnglish (US)
Article number137
Pages (from-to)1118-1124
Number of pages7
JournalProgress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume5751
Issue numberII
DOIs
StatePublished - Sep 19 2005
EventEmerging Lithographic Technologies IX - San Jose, CA, United States
Duration: Mar 1 2005Mar 3 2005

Fingerprint

accumulators
erosion
Erosion
Mirrors
mirrors
Equipment and Supplies
life (durability)
shot
Light
lithography
Ultraviolet Rays
Extreme ultraviolet lithography
Photodiodes
Economics
debris
Debris
ultraviolet radiation
Lithography
photodiodes
Light sources

Keywords

  • Condenser Optics Lifetime
  • Damage Characterization
  • EUV Time Exposure

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Atomic and Molecular Physics, and Optics
  • Radiology Nuclear Medicine and imaging

Cite this

Alman, D. A., Qiu, H., Thompson, K. C., Antonsen, E. L., Spencer, J. B., Hendricks, M. R., ... Bristol, R. (2005). UIUC collector erosion and optical lifetime project results: Time dependent exposures. Progress in Biomedical Optics and Imaging - Proceedings of SPIE, 5751(II), 1118-1124. [137]. https://doi.org/10.1117/12.599978

UIUC collector erosion and optical lifetime project results : Time dependent exposures. / Alman, Darren A.; Qiu, Huatan; Thompson, Keith C.; Antonsen, Erik L.; Spencer, Joshua B.; Hendricks, Matthew R.; Jurczyk, Brian E.; Ruzic, David N; Spila, Timothy; Edwards, Ginger; Wurm, Stefan; Wood, Obert; Bristol, Robert.

In: Progress in Biomedical Optics and Imaging - Proceedings of SPIE, Vol. 5751, No. II, 137, 19.09.2005, p. 1118-1124.

Research output: Contribution to journalConference article

Alman, DA, Qiu, H, Thompson, KC, Antonsen, EL, Spencer, JB, Hendricks, MR, Jurczyk, BE, Ruzic, DN, Spila, T, Edwards, G, Wurm, S, Wood, O & Bristol, R 2005, 'UIUC collector erosion and optical lifetime project results: Time dependent exposures', Progress in Biomedical Optics and Imaging - Proceedings of SPIE, vol. 5751, no. II, 137, pp. 1118-1124. https://doi.org/10.1117/12.599978
Alman, Darren A. ; Qiu, Huatan ; Thompson, Keith C. ; Antonsen, Erik L. ; Spencer, Joshua B. ; Hendricks, Matthew R. ; Jurczyk, Brian E. ; Ruzic, David N ; Spila, Timothy ; Edwards, Ginger ; Wurm, Stefan ; Wood, Obert ; Bristol, Robert. / UIUC collector erosion and optical lifetime project results : Time dependent exposures. In: Progress in Biomedical Optics and Imaging - Proceedings of SPIE. 2005 ; Vol. 5751, No. II. pp. 1118-1124.
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