TY - JOUR
T1 - Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography
AU - Bacon-Brown, Daniel A.
AU - Braun, Paul V.
N1 - Funding Information:
This work is part of the “Light-Material Interactions in Energy Conversion” Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences under Award No. DE-SC0001293. This research was carried out in part in the Center for Microanalysis of Materials in the Frederick Seitz Materials Research Laboratory at the University of Illinois.
Publisher Copyright:
© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2018/4/19
Y1 - 2018/4/19
N2 - Interference lithography is a flexible technique for creating 3D periodic nano- and microstructures that can be used to make a wide variety of crystal lattices, but as it is found, some lattices require index-matched substrates to eliminate reflections at the photoresist–substrate interface. In this study a tunable-refractive index quarter wavelength-thickness polystyrene/poly(vinyl methyl ether) homopolymer blend backside antireflection coating, which alleviates this issue, is presented. The coating's refractive index can be tuned from 1.47 to 1.6, drastically reducing reflections at the photoresist–substrate interface for substrates with refractive indices as low as 1.35 for normal incidence and even lower for angled illumination. By injecting the light through the substrate and applying the antireflection layer to the top of the photoresist, interference lithography can even be performed on high refractive index substrates, such as indium tin oxide (ITO)-coated glass. Fabrication of hexagonal, face-centered cubic, and simple cubic lattices in SU-8 photoresist (refractive index of 1.59) is demonstrated using 532 nm laser light on nonindex matched substrates including ITO-coated glass and borosilicate glass, and the effects of reflection interference on the photonic bandstructure are investigated.
AB - Interference lithography is a flexible technique for creating 3D periodic nano- and microstructures that can be used to make a wide variety of crystal lattices, but as it is found, some lattices require index-matched substrates to eliminate reflections at the photoresist–substrate interface. In this study a tunable-refractive index quarter wavelength-thickness polystyrene/poly(vinyl methyl ether) homopolymer blend backside antireflection coating, which alleviates this issue, is presented. The coating's refractive index can be tuned from 1.47 to 1.6, drastically reducing reflections at the photoresist–substrate interface for substrates with refractive indices as low as 1.35 for normal incidence and even lower for angled illumination. By injecting the light through the substrate and applying the antireflection layer to the top of the photoresist, interference lithography can even be performed on high refractive index substrates, such as indium tin oxide (ITO)-coated glass. Fabrication of hexagonal, face-centered cubic, and simple cubic lattices in SU-8 photoresist (refractive index of 1.59) is demonstrated using 532 nm laser light on nonindex matched substrates including ITO-coated glass and borosilicate glass, and the effects of reflection interference on the photonic bandstructure are investigated.
KW - antireflection
KW - holographic lithography
KW - interference lithography
KW - photonic crystal
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U2 - 10.1002/adom.201701049
DO - 10.1002/adom.201701049
M3 - Article
AN - SCOPUS:85045651698
VL - 6
JO - Advanced Optical Materials
JF - Advanced Optical Materials
SN - 2195-1071
IS - 8
M1 - 1701049
ER -