TY - GEN
T1 - Triple patterning aware routing and its comparison with double patterning aware routing in 14nm technology
AU - Ma, Qiang
AU - Zhang, Hongbo
AU - Wong, Martin D.F.
PY - 2012
Y1 - 2012
N2 - As technology continues to scale to 14nm node, Double Patterning Lithography (DPL) is pushed to near its limit. Triple Patterning Lithography (TPL) is a considerable and natural extension along the paradigm of DPL. With an extra mask to accommodate the features, TPL can be used to eliminate the unresolvable conflicts and minimize the number of stitches, which are pervasive in DPL process, and thus smoothen the layout decomposition step. Considering TPL during routing stage explores a larger solution space and can further improve the layout decomposability. In this paper, we propose the first triple patterning aware detailed routing scheme, and compare its performance with the double patterning version in 14nm node. Experimental results show that, using TPL, the conflicts can be resolved much more easily and the stitches can be significantly reduced in contrast to DPL.
AB - As technology continues to scale to 14nm node, Double Patterning Lithography (DPL) is pushed to near its limit. Triple Patterning Lithography (TPL) is a considerable and natural extension along the paradigm of DPL. With an extra mask to accommodate the features, TPL can be used to eliminate the unresolvable conflicts and minimize the number of stitches, which are pervasive in DPL process, and thus smoothen the layout decomposition step. Considering TPL during routing stage explores a larger solution space and can further improve the layout decomposability. In this paper, we propose the first triple patterning aware detailed routing scheme, and compare its performance with the double patterning version in 14nm node. Experimental results show that, using TPL, the conflicts can be resolved much more easily and the stitches can be significantly reduced in contrast to DPL.
KW - 14nm technology
KW - double patterning aware routing
KW - maze routing
KW - triple patterning aware routing
UR - http://www.scopus.com/inward/record.url?scp=84863542553&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84863542553&partnerID=8YFLogxK
U2 - 10.1145/2228360.2228468
DO - 10.1145/2228360.2228468
M3 - Conference contribution
AN - SCOPUS:84863542553
SN - 9781450311991
T3 - Proceedings - Design Automation Conference
SP - 591
EP - 596
BT - Proceedings of the 49th Annual Design Automation Conference, DAC '12
T2 - 49th Annual Design Automation Conference, DAC '12
Y2 - 3 June 2012 through 7 June 2012
ER -