Triangular elastomeric stamps for optical applications: Near-field phase shift photolithography, 3D proximity field patterning, embossed antireflective coatings, and SERS Sensing

Audrey M. Bowen, Michael J. Motala, J. Matthew Lucas, Sidhartha Gupta, Alfred J. Baca, Agustin Mihi, A. Paul Alivisatos, Paul V. Braun, Ralph G. Nuzzo

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