Time exposure performance of Mo-Au Gibbsian segregating alloys for extreme ultraviolet collector optics

Huatan Qiu, Shailendra N. Srivastava, Keith C. Thompson, Martin J. Neumann, David N. Ruzic

Research output: Contribution to journalArticlepeer-review

Abstract

Successful implementation of extreme ultraviolet (EUV) lithography depends on research and progress toward minimizing collector optics degradation from intense plasma erosion and debris deposition. Thus studying the surface degradation process and implementing innovative methods, which could enhance the surface chemistry causing the mirrors to suffer less damage, is crucial for this technology development. A Mo-Au Gibbsian segregation (GS) alloy is deposited on Si using a dc dual-magnetron cosputtering system and the damage is investigated as a result of time dependent exposure in an EUV source. A thin Au seg-regating layer is maintained through segregation during exposure, even though overall erosion in the Mo-Au sample is taking place in the bulk. The reflective material, Mo, underneath the segregating layer is protected by this sacrificial layer, which is lost due to preferential sputtering. In addition to theoretical work, experimental results are presented on the effectiveness of the GS alloys to be used as potential EUV collector optics material.

Original languageEnglish (US)
Pages (from-to)2443-2451
Number of pages9
JournalApplied Optics
Volume47
Issue number13
DOIs
StatePublished - May 1 2008

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Time exposure performance of Mo-Au Gibbsian segregating alloys for extreme ultraviolet collector optics'. Together they form a unique fingerprint.

Cite this