@article{10d0f52307a345b4b2a99ab42fd62f3b,
title = "Three dimensional silicon photonic crystals fabricated by two photon phase mask lithography",
abstract = "We describe the fabrication of silicon three dimensional photonic crystals using polymer templates defined by a single step, two-photon exposure through a layer of photopolymer with relief molded on its surface. The resulting crystals exhibit high structural quality over large areas, displaying geometries consistent with calculation. Spectroscopic measurements of transmission and reflection through the silicon and polymer structures reveal excellent optical properties, approaching properties predicted by simulations that assume ideal layouts.",
author = "D. Shir and Nelson, {E. C.} and Chen, {Y. C.} and A. Brzezinski and H. Liao and Braun, {P. V.} and P. Wiltzius and Bogart, {K. H.A.} and Rogers, {J. A.}",
note = "Funding Information: We acknowledge T. Banks and K. Colravy for help with processing using facilities at the Materials Research Laboratory. This work was supported by the DOE through Grant No. DE-FG02-07ER46471 and Sandia National Laboratories, a multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company. This work was supported by the Division of Materials Science, Office of Basic Energy Science, for the U.S. Department of Energy{\textquoteright}s National Nuclear Security Administration under Contract No. DE-AC04-94AL85000. The facilities included the Materials Research Laboratory, University of Illinois, which is partially supported by the U.S. Department of Energy under Grants Nos. DE-FG02-07ER46453 and DE-FG02-07ER46471. ",
year = "2009",
doi = "10.1063/1.3036955",
language = "English (US)",
volume = "94",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics",
number = "1",
}