Three-dimensional nanostructures formed by single step, two-photon exposures through elastomeric Penrose quasicrystal phase masks

Daniel Shir, Hongwei Liao, Seokwoo Jeon, Dong Xiao, Harley T. Johnson, Gregory R. Bogart, Katherine H.A. Bogart, John A. Rogers

Research output: Contribution to journalArticle

Abstract

We describe the fabrication of unusual classes of three-dimensional (3D) nanostructures using single step, two-photon exposures of photopolymers through elastomeric phase masks with 5-fold, Penrose quasicrystalline layouts. Confocal imaging, computational studies, and 3D reconstructions reveal the essential aspects of the flow of light through these quasicrystal masks. The resulting nanostructures show interesting features, including quasicrystalline layouts in planes parallel to the sample surfaces, with completely aperiodic variations through their depths, consistent with the optics. Spectroscopic measurements of transmission and reflection provide additional insights.

Original languageEnglish (US)
Pages (from-to)2236-2244
Number of pages9
JournalNano letters
Volume8
Issue number8
DOIs
StatePublished - Aug 1 2008

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Quasicrystals
layouts
Masks
Nanostructures
masks
Photons
Photopolymers
photopolymers
photons
Optics
optics
Imaging techniques
Fabrication
fabrication
elastomeric

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

Cite this

Three-dimensional nanostructures formed by single step, two-photon exposures through elastomeric Penrose quasicrystal phase masks. / Shir, Daniel; Liao, Hongwei; Jeon, Seokwoo; Xiao, Dong; Johnson, Harley T.; Bogart, Gregory R.; Bogart, Katherine H.A.; Rogers, John A.

In: Nano letters, Vol. 8, No. 8, 01.08.2008, p. 2236-2244.

Research output: Contribution to journalArticle

Shir, Daniel ; Liao, Hongwei ; Jeon, Seokwoo ; Xiao, Dong ; Johnson, Harley T. ; Bogart, Gregory R. ; Bogart, Katherine H.A. ; Rogers, John A. / Three-dimensional nanostructures formed by single step, two-photon exposures through elastomeric Penrose quasicrystal phase masks. In: Nano letters. 2008 ; Vol. 8, No. 8. pp. 2236-2244.
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