Three-dimensional nanofabrication with elastomeric phase masks

Daniel J. Shir, Seokwoo Jeon, Hongwei Liao, Matthew Highland, David G. Cahill, Mehmet F. Su, Ihab F. El-Kady, Christos G. Christodoulou, Gregory R. Bogart, Alex V. Hamza, John A. Rogers

Research output: Contribution to journalArticlepeer-review


This Feature Article reviews recent work on an optical technique for fabricating, in a single exposure step, three-dimensional (3D) nanostructures with diverse structural layouts. The approach, which we refer to as proximity field nanopatterning, uses conformable, elastomeric phase masks to pattern thick layers of transparent, photosensitive materials in a conformal contact mode geometry. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science.

Original languageEnglish (US)
Pages (from-to)12945-12958
Number of pages14
JournalJournal of Physical Chemistry B
Issue number45
StatePublished - Nov 15 2007

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry


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