Thermal nanoimprint lithography for drift correction in super-resolution fluorescence microscopy

Keyphrases

• Super-resolution Image 100%
• Super-resolution Fluorescence Microscopy 100%
• Drift Correction 100%
• Thermal Nanoimprint Lithography (T-NIL) 100%
• Cell Adhesion 50%
• Micropatterning 50%
• Cell Viability 50%
• Adsorption 50%
• Structural Stability 50%
• Hippocampal Neurons 50%
• Glutamate Receptors 50%
• Fluorescence Imaging 50%
• Background Fluorescence 50%
• Acquisition Time 50%
• Biological Structures 50%
• Biocompatibility 50%
• Postsynaptic Density Protein 95 (PSD-95) 50%
• Culture Conditions 50%
• Spatial Precision 50%
• Autofluorescence 50%
• Diffraction Limit 50%
• Plastic Materials 50%
• Fiducial Markers 50%
• High Biocompatibility 50%
• Super-resolution Microscopy 50%
• Image Acquisition 50%
• Glass Surface 50%
• Cell Culturing 50%
• Wide-field 50%
• Receptor Density 50%
• Low Fluorescence 50%
• Sub-diffraction 50%
• New Pattern 50%
• Fiducial 50%
• Coverslip 50%
• Live Mammalian Cell 50%
• Ultraviolet Nanoimprint Lithography (UV-NIL) 50%
• Thermal Plastic 50%

Engineering

• Resolution Image 100%
• Nanoimprint Lithography 100%
• Fiducials 100%
• Acquisition Time 50%
• Structural Stability 50%
• Glass Surface 50%
• UV Nanoimprint Lithography 50%

Material Science

• Fluorescence Microscopy 100%
• Lithography 100%
• Biocompatibility 66%
• Density 33%
• Plastic Material 33%
• Surface (Surface Science) 33%