The themal decomposition of alkyl iodides adsorbed on Al(111) and Al(111) surfaces has been studied by using temperature-programmed desorption, integrated desorption mass spectrometry, and high-resolution electron energy loss spectroscopy. We find that alkyl iodides with three or more carbons adsorb dissociatively on aluminum at temperatures ≳130 K. The adsorbed alkyl ligands generated by C-I bond scission are stable on the surface up to ∼450 K and are not significantly affected by the presence of the coadsorbed halogen atom. The dominant mechanism for thermal decomposition of the alkyl fragment is β-hydride elimination, and the kinetics of this surface reaction are similar to those for β-hydride elimination by aluminum alkyls in both the gas phase and solution.
ASJC Scopus subject areas
- Colloid and Surface Chemistry