Thermal Decomposition of Alkyl Halides on Aluminum. 1. Carbon-Halogen Bond Cleavage and Surface β-Hydride Elimination Reactions

Brian E. Bent, Ralph G. Nuzzo, Bernard R. Zegarski, Lawrence H. Dubois

Research output: Contribution to journalArticlepeer-review

Abstract

The themal decomposition of alkyl iodides adsorbed on Al(111) and Al(111) surfaces has been studied by using temperature-programmed desorption, integrated desorption mass spectrometry, and high-resolution electron energy loss spectroscopy. We find that alkyl iodides with three or more carbons adsorb dissociatively on aluminum at temperatures ≳130 K. The adsorbed alkyl ligands generated by C-I bond scission are stable on the surface up to ∼450 K and are not significantly affected by the presence of the coadsorbed halogen atom. The dominant mechanism for thermal decomposition of the alkyl fragment is β-hydride elimination, and the kinetics of this surface reaction are similar to those for β-hydride elimination by aluminum alkyls in both the gas phase and solution.

Original languageEnglish (US)
Pages (from-to)1137-1142
Number of pages6
JournalJournal of the American Chemical Society
Volume113
Issue number4
DOIs
StatePublished - 1991
Externally publishedYes

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)
  • Biochemistry
  • Colloid and Surface Chemistry

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