Abstract
The thermal conductivity of Si-Ge superlattices with superlattice periods 30<L<300 Å, and a Si0.85Ge0.15 thin film alloy is measured using the 3ω method. The alloy film shows a conductivity comparable to bulk SiGe alloys while the superlattice samples have a thermal conductivity that is smaller than the alloy. For 30<L<70 Å, the thermal conductivity decreases with decreasing L; these data provide a lower limit to the interface thermal conductance G of epitaxial Si-Ge interfaces: G> 2 × 10 W m-2 KT-1 at 200 K. Superlattices with relatively longer periods, L> 130 Å, have smaller thermal conductivities than the short-period samples. This unexpected result is attributed to a strong disruption of the lattice vibrations by extended defects produced during lattice-mismatched growth.
Original language | English (US) |
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Pages (from-to) | 2957-2959 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 70 |
Issue number | 22 |
DOIs | |
State | Published - Jun 2 1997 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)