The effects of oxide stress waveform on MOSFET performance

Elyse Rosenbaum, Zhihong Liu, Chenming Hu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Three different waveforms were used to study the behavior of n-MOSFETs after dynamic oxide stress. It is shown that the transport and detrapping properties of holes generated near the anode can account for the differences observed after unipolar and bipolar oxide stressing. Bipolar stress yields a lower rate of bulk charge trapping and longer time to breakdown than unipolar stress. The difference is dependent on both field and frequency. At the same time, bipolar stress leads to enhanced interface trap generation. Since the gate-drain overlap region of MOSFETs in circuits is subject to bipolar stress, DC transistor stress tests may underestimate the MOSFET degradation rate. The observation that interface trap density does not saturate during bipolar stress as readily as during unipolar stress is particularly alarming. Bidirectional tunneling current creates a larger number of interface traps than does unidirectional gate current. Even though unipolar stressed devices suffer more bulk trapping and TDDB (time-dependent dielectric breakdown) degradation than do bipolar stressed devices, the degradation in transconductance, mobility, and threshold voltage is worse in bipolar stressed devices.

Original languageEnglish (US)
Title of host publicationInternational Electron Devices Meeting 1991, IEDM 1991
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages719-722
Number of pages4
ISBN (Electronic)0780302435
DOIs
StatePublished - Jan 1 1991
Externally publishedYes
EventInternational Electron Devices Meeting, IEDM 1991 - Washington, United States
Duration: Dec 8 1991Dec 11 1991

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
Volume1991-January
ISSN (Print)0163-1918

Other

OtherInternational Electron Devices Meeting, IEDM 1991
CountryUnited States
CityWashington
Period12/8/9112/11/91

Fingerprint

Oxides
waveforms
field effect transistors
oxides
Degradation
traps
degradation
breakdown
trapping
Charge trapping
Transconductance
Electric breakdown
Threshold voltage
electric potential
transconductance
Yield stress
threshold voltage
Anodes
Transistors
anodes

Keywords

  • Anodes
  • Bipolar transistor circuits
  • Circuit testing
  • Degradation
  • Dielectric breakdown
  • Electric breakdown
  • Frequency
  • MOSFET circuits
  • Stress
  • Tunneling

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this

Rosenbaum, E., Liu, Z., & Hu, C. (1991). The effects of oxide stress waveform on MOSFET performance. In International Electron Devices Meeting 1991, IEDM 1991 (pp. 719-722). [235322] (Technical Digest - International Electron Devices Meeting, IEDM; Vol. 1991-January). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IEDM.1991.235322

The effects of oxide stress waveform on MOSFET performance. / Rosenbaum, Elyse; Liu, Zhihong; Hu, Chenming.

International Electron Devices Meeting 1991, IEDM 1991. Institute of Electrical and Electronics Engineers Inc., 1991. p. 719-722 235322 (Technical Digest - International Electron Devices Meeting, IEDM; Vol. 1991-January).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Rosenbaum, E, Liu, Z & Hu, C 1991, The effects of oxide stress waveform on MOSFET performance. in International Electron Devices Meeting 1991, IEDM 1991., 235322, Technical Digest - International Electron Devices Meeting, IEDM, vol. 1991-January, Institute of Electrical and Electronics Engineers Inc., pp. 719-722, International Electron Devices Meeting, IEDM 1991, Washington, United States, 12/8/91. https://doi.org/10.1109/IEDM.1991.235322
Rosenbaum E, Liu Z, Hu C. The effects of oxide stress waveform on MOSFET performance. In International Electron Devices Meeting 1991, IEDM 1991. Institute of Electrical and Electronics Engineers Inc. 1991. p. 719-722. 235322. (Technical Digest - International Electron Devices Meeting, IEDM). https://doi.org/10.1109/IEDM.1991.235322
Rosenbaum, Elyse ; Liu, Zhihong ; Hu, Chenming. / The effects of oxide stress waveform on MOSFET performance. International Electron Devices Meeting 1991, IEDM 1991. Institute of Electrical and Electronics Engineers Inc., 1991. pp. 719-722 (Technical Digest - International Electron Devices Meeting, IEDM).
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