Abstract
The implantation of single-crystal CuInSe2 with O ions is known to cause an n-to p-type carrier conversion and a strong enhancement in photoconductive response. In this paper, we present the first microstructural investigation of O and Xe ion implant damage in CuInSe2 as a function of implant dose. Cross-sectional transmission electron microscopy and secondary-ion mass spectroscopy depth profiling have been used to characterize the implants. Our microstructural observations are correlated both with the theoretical implant profiles and with the measured photoconductivity of the material.
Original language | English (US) |
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Pages (from-to) | 1131-1145 |
Number of pages | 15 |
Journal | Philosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties |
Volume | 73 |
Issue number | 4 |
DOIs | |
State | Published - Apr 1996 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- General Materials Science
- Condensed Matter Physics
- Physics and Astronomy (miscellaneous)
- Metals and Alloys