The 2017 Plasma Roadmap: Low temperature plasma science and technology

I. Adamovich, S. D. Baalrud, A. Bogaerts, P. J. Bruggeman, M. Cappelli, V. Colombo, U. Czarnetzki, U. Ebert, James Gary Eden, P. Favia, D. B. Graves, S. Hamaguchi, G. Hieftje, M. Hori, I. D. Kaganovich, U. Kortshagen, M. J. Kushner, N. J. Mason, S. Mazouffre, S. Mededovic ThagardH. R. Metelmann, A. Mizuno, E. Moreau, A. B. Murphy, B. A. Niemira, G. S. Oehrlein, Z. Lj Petrovic, L. C. Pitchford, Y. K. Pu, S. Rauf, O. Sakai, S. Samukawa, S. Starikovskaia, J. Tennyson, K. Terashima, M. M. Turner, M. C.M. Van De Sanden, A. Vardelle

Research output: Contribution to journalReview article

Abstract

Journal of Physics D: Applied Physics published the first Plasma Roadmap in 2012 consisting of the individual perspectives of 16 leading experts in the various sub-fields of low temperature plasma science and technology. The 2017 Plasma Roadmap is the first update of a planned series of periodic updates of the Plasma Roadmap. The continuously growing interdisciplinary nature of the low temperature plasma field and its equally broad range of applications are making it increasingly difficult to identify major challenges that encompass all of the many sub-fields and applications. This intellectual diversity is ultimately a strength of the field. The current state of the art for the 19 sub-fields addressed in this roadmap demonstrates the enviable track record of the low temperature plasma field in the development of plasmas as an enabling technology for a vast range of technologies that underpin our modern society. At the same time, the many important scientific and technological challenges shared in this roadmap show that the path forward is not only scientifically rich but has the potential to make wide and far reaching contributions to many societal challenges.

Original languageEnglish (US)
Article number323001
JournalJournal of Physics D: Applied Physics
Volume50
Issue number32
DOIs
StatePublished - Jul 14 2017

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cold plasmas
Plasmas
Temperature
physics
Physics

Keywords

  • low-temperature plasma
  • plasma
  • roadmap

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

Cite this

Adamovich, I., Baalrud, S. D., Bogaerts, A., Bruggeman, P. J., Cappelli, M., Colombo, V., ... Vardelle, A. (2017). The 2017 Plasma Roadmap: Low temperature plasma science and technology. Journal of Physics D: Applied Physics, 50(32), [323001]. https://doi.org/10.1088/1361-6463/aa76f5

The 2017 Plasma Roadmap : Low temperature plasma science and technology. / Adamovich, I.; Baalrud, S. D.; Bogaerts, A.; Bruggeman, P. J.; Cappelli, M.; Colombo, V.; Czarnetzki, U.; Ebert, U.; Eden, James Gary; Favia, P.; Graves, D. B.; Hamaguchi, S.; Hieftje, G.; Hori, M.; Kaganovich, I. D.; Kortshagen, U.; Kushner, M. J.; Mason, N. J.; Mazouffre, S.; Thagard, S. Mededovic; Metelmann, H. R.; Mizuno, A.; Moreau, E.; Murphy, A. B.; Niemira, B. A.; Oehrlein, G. S.; Petrovic, Z. Lj; Pitchford, L. C.; Pu, Y. K.; Rauf, S.; Sakai, O.; Samukawa, S.; Starikovskaia, S.; Tennyson, J.; Terashima, K.; Turner, M. M.; Van De Sanden, M. C.M.; Vardelle, A.

In: Journal of Physics D: Applied Physics, Vol. 50, No. 32, 323001, 14.07.2017.

Research output: Contribution to journalReview article

Adamovich, I, Baalrud, SD, Bogaerts, A, Bruggeman, PJ, Cappelli, M, Colombo, V, Czarnetzki, U, Ebert, U, Eden, JG, Favia, P, Graves, DB, Hamaguchi, S, Hieftje, G, Hori, M, Kaganovich, ID, Kortshagen, U, Kushner, MJ, Mason, NJ, Mazouffre, S, Thagard, SM, Metelmann, HR, Mizuno, A, Moreau, E, Murphy, AB, Niemira, BA, Oehrlein, GS, Petrovic, ZL, Pitchford, LC, Pu, YK, Rauf, S, Sakai, O, Samukawa, S, Starikovskaia, S, Tennyson, J, Terashima, K, Turner, MM, Van De Sanden, MCM & Vardelle, A 2017, 'The 2017 Plasma Roadmap: Low temperature plasma science and technology', Journal of Physics D: Applied Physics, vol. 50, no. 32, 323001. https://doi.org/10.1088/1361-6463/aa76f5
Adamovich I, Baalrud SD, Bogaerts A, Bruggeman PJ, Cappelli M, Colombo V et al. The 2017 Plasma Roadmap: Low temperature plasma science and technology. Journal of Physics D: Applied Physics. 2017 Jul 14;50(32). 323001. https://doi.org/10.1088/1361-6463/aa76f5
Adamovich, I. ; Baalrud, S. D. ; Bogaerts, A. ; Bruggeman, P. J. ; Cappelli, M. ; Colombo, V. ; Czarnetzki, U. ; Ebert, U. ; Eden, James Gary ; Favia, P. ; Graves, D. B. ; Hamaguchi, S. ; Hieftje, G. ; Hori, M. ; Kaganovich, I. D. ; Kortshagen, U. ; Kushner, M. J. ; Mason, N. J. ; Mazouffre, S. ; Thagard, S. Mededovic ; Metelmann, H. R. ; Mizuno, A. ; Moreau, E. ; Murphy, A. B. ; Niemira, B. A. ; Oehrlein, G. S. ; Petrovic, Z. Lj ; Pitchford, L. C. ; Pu, Y. K. ; Rauf, S. ; Sakai, O. ; Samukawa, S. ; Starikovskaia, S. ; Tennyson, J. ; Terashima, K. ; Turner, M. M. ; Van De Sanden, M. C.M. ; Vardelle, A. / The 2017 Plasma Roadmap : Low temperature plasma science and technology. In: Journal of Physics D: Applied Physics. 2017 ; Vol. 50, No. 32.
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abstract = "Journal of Physics D: Applied Physics published the first Plasma Roadmap in 2012 consisting of the individual perspectives of 16 leading experts in the various sub-fields of low temperature plasma science and technology. The 2017 Plasma Roadmap is the first update of a planned series of periodic updates of the Plasma Roadmap. The continuously growing interdisciplinary nature of the low temperature plasma field and its equally broad range of applications are making it increasingly difficult to identify major challenges that encompass all of the many sub-fields and applications. This intellectual diversity is ultimately a strength of the field. The current state of the art for the 19 sub-fields addressed in this roadmap demonstrates the enviable track record of the low temperature plasma field in the development of plasmas as an enabling technology for a vast range of technologies that underpin our modern society. At the same time, the many important scientific and technological challenges shared in this roadmap show that the path forward is not only scientifically rich but has the potential to make wide and far reaching contributions to many societal challenges.",
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AU - Baalrud, S. D.

AU - Bogaerts, A.

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AU - Cappelli, M.

AU - Colombo, V.

AU - Czarnetzki, U.

AU - Ebert, U.

AU - Eden, James Gary

AU - Favia, P.

AU - Graves, D. B.

AU - Hamaguchi, S.

AU - Hieftje, G.

AU - Hori, M.

AU - Kaganovich, I. D.

AU - Kortshagen, U.

AU - Kushner, M. J.

AU - Mason, N. J.

AU - Mazouffre, S.

AU - Thagard, S. Mededovic

AU - Metelmann, H. R.

AU - Mizuno, A.

AU - Moreau, E.

AU - Murphy, A. B.

AU - Niemira, B. A.

AU - Oehrlein, G. S.

AU - Petrovic, Z. Lj

AU - Pitchford, L. C.

AU - Pu, Y. K.

AU - Rauf, S.

AU - Sakai, O.

AU - Samukawa, S.

AU - Starikovskaia, S.

AU - Tennyson, J.

AU - Terashima, K.

AU - Turner, M. M.

AU - Van De Sanden, M. C.M.

AU - Vardelle, A.

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