Temperature dependence of Mo-Au Gibbsian segregating alloys

Huatan Qiu, S. N. Srivastava, Keith C. Thompson, Martin J. Neumann, David N. Ruzic

Research output: Contribution to journalArticle

Abstract

A critical challenge for the success of extreme ultraviolet (EUV) lithography is to prevent collector mirror surface damage and reflectivity loss. Plasma debris and radiation damage the mirror and degrade the reflectivity. We study an innovative approach to the design and fabrication of collector mirror surface materials to improve collector lifetime. A Mo-Au Gibbsian segregation (GS) alloy is developed on silicon using a dc dual-magnetron cosputtering system, and the temperature effect on mirror damage is investigated. Result shows that a thin Au segregating layer is maintained during exposure, even though overall erosion is taking place. The reflective material underneath the segregating layer, Mo, is protected by the Au sacrificial layer, which is preferentially sputtered. Both theoretical and experimental studies have been performed to prove the effectiveness of the GS alloys for use as an EUV collector optics material.

Original languageEnglish (US)
Article number033004
JournalJournal of Micro/Nanolithography, MEMS, and MOEMS
Volume7
Issue number3
DOIs
StatePublished - Jan 1 2008

Keywords

  • Collector mirror
  • EUV lithography
  • Gibbsian alloys

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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