Temperature dependence of Mo-Au Gibbsian segregating alloys

Huatan Qiu; S. N. Srivastava; Keith C. Thompson; Martin J. Neumann; David N. Ruzic

doi:10.1117/1.2964218

Temperature dependence of Mo-Au Gibbsian segregating alloys

Huatan Qiu, S. N. Srivastava, Keith C. Thompson, Martin J. Neumann, David N. Ruzic

Research output: Contribution to journal › Article › peer-review

Abstract

A critical challenge for the success of extreme ultraviolet (EUV) lithography is to prevent collector mirror surface damage and reflectivity loss. Plasma debris and radiation damage the mirror and degrade the reflectivity. We study an innovative approach to the design and fabrication of collector mirror surface materials to improve collector lifetime. A Mo-Au Gibbsian segregation (GS) alloy is developed on silicon using a dc dual-magnetron cosputtering system, and the temperature effect on mirror damage is investigated. Result shows that a thin Au segregating layer is maintained during exposure, even though overall erosion is taking place. The reflective material underneath the segregating layer, Mo, is protected by the Au sacrificial layer, which is preferentially sputtered. Both theoretical and experimental studies have been performed to prove the effectiveness of the GS alloys for use as an EUV collector optics material.

Original language	English (US)
Article number	033004
Journal	Journal of Micro/Nanolithography, MEMS, and MOEMS
Volume	7
Issue number	3
DOIs	https://doi.org/10.1117/1.2964218
State	Published - 2008

Keywords

Collector mirror
EUV lithography
Gibbsian alloys

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Mechanical Engineering
Electrical and Electronic Engineering

Online availability

10.1117/1.2964218

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title = "Temperature dependence of Mo-Au Gibbsian segregating alloys",

abstract = "A critical challenge for the success of extreme ultraviolet (EUV) lithography is to prevent collector mirror surface damage and reflectivity loss. Plasma debris and radiation damage the mirror and degrade the reflectivity. We study an innovative approach to the design and fabrication of collector mirror surface materials to improve collector lifetime. A Mo-Au Gibbsian segregation (GS) alloy is developed on silicon using a dc dual-magnetron cosputtering system, and the temperature effect on mirror damage is investigated. Result shows that a thin Au segregating layer is maintained during exposure, even though overall erosion is taking place. The reflective material underneath the segregating layer, Mo, is protected by the Au sacrificial layer, which is preferentially sputtered. Both theoretical and experimental studies have been performed to prove the effectiveness of the GS alloys for use as an EUV collector optics material.",

keywords = "Collector mirror, EUV lithography, Gibbsian alloys",

author = "Huatan Qiu and Srivastava, {S. N.} and Thompson, {Keith C.} and Neumann, {Martin J.} and Ruzic, {David N.}",

note = "Funding Information: We are thankful for the support from SEMATECH, Lawrence Livermore National Laboratory, Sandia National Laboratory at Livermore, Intel Components Research, and Xtreme Technologies GmbH. We also thank Prof. Angus Rockett for providing the original deposition equipment. A portion of this research was carried out in the Center for Microanalysis of Materials, University of Illinois, which is partially supported by the U.S. Department of Energy under Grant No. DEFG02-91-ER45439. We also thank our undergraduate Jesse C. Anderson for the help with GS alloy fabrication and the buildup of DMCS system.",

year = "2008",

doi = "10.1117/1.2964218",

language = "English (US)",

volume = "7",

journal = "Journal of Micro/ Nanolithography, MEMS, and MOEMS",

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TY - JOUR

T1 - Temperature dependence of Mo-Au Gibbsian segregating alloys

AU - Qiu, Huatan

AU - Srivastava, S. N.

AU - Thompson, Keith C.

AU - Neumann, Martin J.

AU - Ruzic, David N.

N1 - Funding Information: We are thankful for the support from SEMATECH, Lawrence Livermore National Laboratory, Sandia National Laboratory at Livermore, Intel Components Research, and Xtreme Technologies GmbH. We also thank Prof. Angus Rockett for providing the original deposition equipment. A portion of this research was carried out in the Center for Microanalysis of Materials, University of Illinois, which is partially supported by the U.S. Department of Energy under Grant No. DEFG02-91-ER45439. We also thank our undergraduate Jesse C. Anderson for the help with GS alloy fabrication and the buildup of DMCS system.

PY - 2008

Y1 - 2008

N2 - A critical challenge for the success of extreme ultraviolet (EUV) lithography is to prevent collector mirror surface damage and reflectivity loss. Plasma debris and radiation damage the mirror and degrade the reflectivity. We study an innovative approach to the design and fabrication of collector mirror surface materials to improve collector lifetime. A Mo-Au Gibbsian segregation (GS) alloy is developed on silicon using a dc dual-magnetron cosputtering system, and the temperature effect on mirror damage is investigated. Result shows that a thin Au segregating layer is maintained during exposure, even though overall erosion is taking place. The reflective material underneath the segregating layer, Mo, is protected by the Au sacrificial layer, which is preferentially sputtered. Both theoretical and experimental studies have been performed to prove the effectiveness of the GS alloys for use as an EUV collector optics material.

AB - A critical challenge for the success of extreme ultraviolet (EUV) lithography is to prevent collector mirror surface damage and reflectivity loss. Plasma debris and radiation damage the mirror and degrade the reflectivity. We study an innovative approach to the design and fabrication of collector mirror surface materials to improve collector lifetime. A Mo-Au Gibbsian segregation (GS) alloy is developed on silicon using a dc dual-magnetron cosputtering system, and the temperature effect on mirror damage is investigated. Result shows that a thin Au segregating layer is maintained during exposure, even though overall erosion is taking place. The reflective material underneath the segregating layer, Mo, is protected by the Au sacrificial layer, which is preferentially sputtered. Both theoretical and experimental studies have been performed to prove the effectiveness of the GS alloys for use as an EUV collector optics material.

KW - Collector mirror

KW - EUV lithography

KW - Gibbsian alloys

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Temperature dependence of Mo-Au Gibbsian segregating alloys

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