@article{56ed75a5a9a445e49fe5779ac2e592d4,
title = "Temperature-dependence of ink transport during thermal dip-pen nanolithography",
abstract = "We investigate the control of tip temperature on feature size during dip-pen nanolithography (DPN) of mercaptohexadecanoic acid (MHA) on Au. Heated atomic force microscopy (AFM) probes operated between 25 °C and 50 °C wrote nanostructures of MHA for various dwell times and tip speeds. The feature size exhibited an exponential dependence on tip temperature with an apparent activation barrier of 165 kJ/mol. Analysis of the ink transfer process shows that, while ∼1/3 of the barrier is from ink dissolution into the meniscus, the rest reflects the barrier to adsorption onto the growing feature, a process that has been ignored in previous DPN models.",
author = "Sungwook Chung and Felts, {Jonathan R.} and Debin Wang and King, {William P.} and {De Yoreo}, {James J.}",
note = "The work was performed at the Molecular Foundry, Lawrence Berkeley National Laboratory under U.S. Department of Energy (DOE) under Contract No. DE-AC02-05CH11231. We gratefully acknowledge support from Defense Advanced Research Projects Agency (DARPA) program on Tip-Based Nanofabrication (TBN). This research was supported in part by an award from the DOE Office of Science Graduate Fellowship Program (DOE SCGF). The DOE SCGF program is administered by the Oak Ridge Institute for Science and Education (ORISE) for the DOE. ORISE is managed by Oak Ridge Associated Universities (ORAU) under DOE Contract No. DE-AC05-06OR23100.",
year = "2011",
month = nov,
day = "7",
doi = "10.1063/1.3657777",
language = "English (US)",
volume = "99",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics",
number = "19",
}