Synthesis of Tantalum Pentoxide films for high temperature applications

Vaidyanathan Ravi Subramanian; Nicholas Ndiege; Mark A. Shannon; Edmund G. Seebauer; Richard I. Masel

Synthesis of Tantalum Pentoxide films for high temperature applications

Vaidyanathan Ravi Subramanian, Nicholas Ndiege, Mark A. Shannon, Edmund G. Seebauer, Richard I. Masel

Research output: Contribution to conference › Paper › peer-review

Abstract

Thick Tantalum Pentoxide (Ta2O5) films have been prepared on silicon 〈100〉 and quartz substrates from sol-gel synthesized precursors using spin coating. The effects of sol aging, spin rate and binder in promoting formation of stable Ta2O5 films are discussed. We report, for the first time, films of 1.6μm thickness that can withstand temperature of up to 900°C for over 9 hours and still observed to be stable, uniform and crack-free. Optical properties of the nanoporous films indicate that these are good candidates for high temperature microdevice application such as waveguides.

Original language	English (US)
Pages	4737
Number of pages	1
State	Published - 2005
Externally published	Yes
Event	05AIChE: 2005 AIChE Annual Meeting and Fall Showcase - Cincinnati, OH, United States Duration: Oct 30 2005 → Nov 4 2005

Other

Other	05AIChE: 2005 AIChE Annual Meeting and Fall Showcase
Country/Territory	United States
City	Cincinnati, OH
Period	10/30/05 → 11/4/05

ASJC Scopus subject areas

General Engineering

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title = "Synthesis of Tantalum Pentoxide films for high temperature applications",

abstract = "Thick Tantalum Pentoxide (Ta2O5) films have been prepared on silicon 〈100〉 and quartz substrates from sol-gel synthesized precursors using spin coating. The effects of sol aging, spin rate and binder in promoting formation of stable Ta2O5 films are discussed. We report, for the first time, films of 1.6μm thickness that can withstand temperature of up to 900°C for over 9 hours and still observed to be stable, uniform and crack-free. Optical properties of the nanoporous films indicate that these are good candidates for high temperature microdevice application such as waveguides.",

author = "Subramanian, {Vaidyanathan Ravi} and Nicholas Ndiege and Shannon, {Mark A.} and Seebauer, {Edmund G.} and Masel, {Richard I.}",

year = "2005",

language = "English (US)",

pages = "4737",

note = "05AIChE: 2005 AIChE Annual Meeting and Fall Showcase ; Conference date: 30-10-2005 Through 04-11-2005",

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TY - CONF

T1 - Synthesis of Tantalum Pentoxide films for high temperature applications

AU - Subramanian, Vaidyanathan Ravi

AU - Ndiege, Nicholas

AU - Shannon, Mark A.

AU - Seebauer, Edmund G.

AU - Masel, Richard I.

PY - 2005

Y1 - 2005

N2 - Thick Tantalum Pentoxide (Ta2O5) films have been prepared on silicon 〈100〉 and quartz substrates from sol-gel synthesized precursors using spin coating. The effects of sol aging, spin rate and binder in promoting formation of stable Ta2O5 films are discussed. We report, for the first time, films of 1.6μm thickness that can withstand temperature of up to 900°C for over 9 hours and still observed to be stable, uniform and crack-free. Optical properties of the nanoporous films indicate that these are good candidates for high temperature microdevice application such as waveguides.

AB - Thick Tantalum Pentoxide (Ta2O5) films have been prepared on silicon 〈100〉 and quartz substrates from sol-gel synthesized precursors using spin coating. The effects of sol aging, spin rate and binder in promoting formation of stable Ta2O5 films are discussed. We report, for the first time, films of 1.6μm thickness that can withstand temperature of up to 900°C for over 9 hours and still observed to be stable, uniform and crack-free. Optical properties of the nanoporous films indicate that these are good candidates for high temperature microdevice application such as waveguides.

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M3 - Paper

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SP - 4737

T2 - 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase

Y2 - 30 October 2005 through 4 November 2005

ER -

Synthesis of Tantalum Pentoxide films for high temperature applications

Abstract

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