Synthesis and size differentiation of Ge nanocrystals in amorphous SiO ₂

Keyphrases

• Amorphous SiO2 100%
• Ge Nanocrystals 100%
• Size Differentiation 100%
• Si Substrate 66%
• Energy Dispersive X-ray Analysis 66%
• Annealing 33%
• Silica 33%
• Nanocrystals 33%
• Transmission Electron Microscopy 33%
• High-resolution 33%
• High-resolution Electron Energy Loss Spectroscopy (HREELS) 33%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 33%
• Transmission Electron Microscopy Images 33%
• Nanocrystal Formation 33%
• Spatially Separated 33%
• Amorphous Silicon Oxide 33%
• Ge Film 33%
• Silicon Dioxide Films 33%
• Germanosilicate 33%

Physics

• X Ray Spectroscopy 100%
• Transmission Electron Microscopy 100%
• Electron Energy 50%
• High Resolution 50%
• Silicon Dioxide 50%
• Silica 50%
• Vapor Deposition 50%
• Amorphous Silicon 50%

Material Science

• Amorphous Material 100%
• Nanocrystalline Material 100%
• Film 50%
• Transmission Electron Microscopy 50%
• Energy Dispersive X Ray Analysis 50%
• Silicon Dioxide 25%
• Amorphous Silicon 25%
• Electron Energy Loss Spectrometry 25%
• Plasma-Enhanced Chemical Vapor Deposition 25%