Surface Organometallic Chemistry in the Chemical Vapor Deposition of Aluminum Films Using Triisobutylaluminum: β-Hydride and β-Alkyl Elimination Reactions of Surface Alkyl Intermediates
Research output: Contribution to journal › Article › peer-review
Fingerprint
Dive into the research topics of 'Surface Organometallic Chemistry in the Chemical Vapor Deposition of Aluminum Films Using Triisobutylaluminum: β-Hydride and β-Alkyl Elimination Reactions of Surface Alkyl Intermediates'. Together they form a unique fingerprint.