Surface hydrogen release during the growth of a Si: H by reactive magnetron sputtering

Engineering & Materials Science

• Amorphous silicon 12%
• Argon 5%
• Experiments 1%
• Film growth 7%
• Fluxes 11%
• Hydrogen 50%
• Magnetron sputtering 84%
• Mass spectrometers 6%
• Reactive sputtering 100%
• Silicon 10%
• Substrates 6%
• Temperature 1%
• Thin films 4%

Chemical Compounds

• Amorphous Silicon 13%
• Hydrogen 32%
• Liquid Film 9%
• Magnetron Sputtering 73%
• Partial Pressure 9%
• Surface 20%

Physics & Astronomy

• amorphous silicon 8%
• argon 3%
• atmospheres 3%
• direct current 3%
• hydrogen 38%
• impingement 5%
• magnetron sputtering 53%
• mass balance 6%
• mass spectrometers 5%
• partial pressure 9%
• silicon 7%
• temperature 1%
• thin films 2%