Surface-assisted defect engineering of point defects in ZnO

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Abstract

Semiconductor surfaces facilitate the injection of highly mobile point defects into the underlying bulk, thereby offering a special means to manipulate bulk defect concentrations. The present work combines diffusion experiments and first-principles calculations for polar ZnO (0001) surface to demonstrate such manipulation. The rate behavior of oxygen interstitial injection varies dramatically between the Zn- and O-terminated ZnO surfaces. A specific injection pathway for the Zn-terminated surface is identified, and activation barrier determined from the first-principles calculations agrees closely with the experimental activation energy of 1.7 eV.

Original languageEnglish (US)
Article number241603
JournalApplied Physics Letters
Volume108
Issue number24
DOIs
StatePublished - Jun 13 2016

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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