TY - GEN
T1 - Surace-Enhanced Two-Phase Cold Plate Designs for High Power Dissipation in Data Centers
AU - Qiu, Haoyun
AU - Kabirzadeh, Pouya
AU - Apigo, David J.
AU - Parbat, Sarwesh
AU - Faisal, Syed
AU - Roy, Rishav
AU - Singh, Bakhshish Preet
AU - Salamon, Todd
AU - Miljkovic, Nenad
N1 - The authors gratefully acknowledge funding support from the Advanced Research Project Agency-Energy (ARPA-E) with cooperative agreement DE-AR0001597.
PY - 2024
Y1 - 2024
N2 - Multi-chip modules (MCMs) have become a popular architecture adopted in datacenters to collocate computation, memory, and communications. Their high-power density brings considerable challenges to the use of conventional air-cooling. Higher facility temperatures are preferred because they enable heat capture and reuse as well as simpler heat rejection architectures with low water usage such as dry cooling. This push for higher coolant temperature, alongside the elevated power density, has placed an even more stringent requirement on minimizing the chip junction-to-coolant thermal resistance. Here, we developed a high-performance, energy-efficient, and scalable thermal management approach based on two-phase cooling using R1233zd(E) refrigerant. The approach utilizes custom copper and aluminum microchannel evaporators capable of dissipating heat loads up to 1 kW over a 76 mm × 76 mm MCM-relevant footprint. The custom high-aspect-ratio (~10) microchannel (300~550 μm) evaporators are designed and fabricated using either electrical discharge machining or skiving. Experiments showed that a skived copper cold plate with 550 μm channel width, 375 μm fin width, and 5.25 mm fin height can reach a junction-to-coolant thermal resistance < 0.0083 K/W at a 1 kW heat load. We employ surface structuring to enhance the refrigerant flow boiling performance. Etched aluminum is used due to its promotion of nucleation and rewetting arising from its roughness and wickability. Etching was carried out on an EDM aluminum fin plate with 300 μm channel width, 250 μm fin width, and 2.3 mm fin height. We observed a 1.7× higher refrigerant flow boiling heat transfer coefficient improvement after surface structuring, achieving a thermal resistance of 0.0085 K/W at 1,1 kW heat load. Our work demonstrates that two-phase cooling, favored by low-profile MCMs, can enhance the power density at the server level.
AB - Multi-chip modules (MCMs) have become a popular architecture adopted in datacenters to collocate computation, memory, and communications. Their high-power density brings considerable challenges to the use of conventional air-cooling. Higher facility temperatures are preferred because they enable heat capture and reuse as well as simpler heat rejection architectures with low water usage such as dry cooling. This push for higher coolant temperature, alongside the elevated power density, has placed an even more stringent requirement on minimizing the chip junction-to-coolant thermal resistance. Here, we developed a high-performance, energy-efficient, and scalable thermal management approach based on two-phase cooling using R1233zd(E) refrigerant. The approach utilizes custom copper and aluminum microchannel evaporators capable of dissipating heat loads up to 1 kW over a 76 mm × 76 mm MCM-relevant footprint. The custom high-aspect-ratio (~10) microchannel (300~550 μm) evaporators are designed and fabricated using either electrical discharge machining or skiving. Experiments showed that a skived copper cold plate with 550 μm channel width, 375 μm fin width, and 5.25 mm fin height can reach a junction-to-coolant thermal resistance < 0.0083 K/W at a 1 kW heat load. We employ surface structuring to enhance the refrigerant flow boiling performance. Etched aluminum is used due to its promotion of nucleation and rewetting arising from its roughness and wickability. Etching was carried out on an EDM aluminum fin plate with 300 μm channel width, 250 μm fin width, and 2.3 mm fin height. We observed a 1.7× higher refrigerant flow boiling heat transfer coefficient improvement after surface structuring, achieving a thermal resistance of 0.0085 K/W at 1,1 kW heat load. Our work demonstrates that two-phase cooling, favored by low-profile MCMs, can enhance the power density at the server level.
KW - Chip liquid cooling
KW - cold plate
KW - datacenters
KW - flow boiling
KW - microstructures
UR - http://www.scopus.com/inward/record.url?scp=85207827609&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85207827609&partnerID=8YFLogxK
U2 - 10.1109/ITherm55375.2024.10709400
DO - 10.1109/ITherm55375.2024.10709400
M3 - Conference contribution
AN - SCOPUS:85207827609
T3 - InterSociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems, ITHERM
BT - Proceedings of the 23rd IEEE Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems, ITherm 2024
PB - IEEE Computer Society
T2 - 23rd IEEE Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems, ITherm 2024
Y2 - 28 May 2024 through 31 May 2024
ER -