Submicron particle removal

Martin J Neumann (Inventor), David N Ruzic (Inventor), Brian E Jurczyk (Inventor), Huatan Qiu (Inventor), Darren Alman (Inventor)

Research output: Patent


A system for non-contact cleaning of particulate contamination of surfaces includes one or more sources that create a charge imbalance between a surface and particles that contaminate the surface, and a power supply that creates a pulsed electrical bias on the surface. This imbalance produces an electrostatic force that propels the particles off the surface. The cleaning process can be associated, for example, with microelectronic lithography and manufacturing.
Original languageEnglish (US)
U.S. patent number7528386
Filing date12/5/05
StatePublished - May 5 2009


Dive into the research topics of 'Submicron particle removal'. Together they form a unique fingerprint.

Cite this