Study of Sn removal by surface wave plasma for source cleaning

Gianluca Panici, Dren Qerimi, David N Ruzic

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A hydrogen plasma cleaning technique to clean Sn off of EUV sources is studied in detail. The cleaning process uses hydrogen radicals (formed in the hydrogen plasma) to interact with Sn-coated surfaces, forming SnH4 and being pumped away. This technique has been used to clean a 300mm-diameter stainless steel dummy collector optic, and EUV reflectivity of multilayer mirror samples was restored after cleaning Sn from them, validating the potential of this technology. A concern for plasma based methods is the implantation of high energy hydrogen ions into the MLM, reducing reflectivity and possibly blistering. With a surface wave plasma (SWP) this concern is alleviated somewhat because of lower ion energies. Surface wave plasmas have lower electron temperatures than conventional sources in the range of 1 to 3 eV. In addition, SWP sources result in plasma densities on the order of 1011-12cm-3, allowing for greater utilization of ion etch enhancement. Experiments measuring radical density and etch rate profiles have been conducted and the results from these measurements are presented. These will help demonstrate scalability of SWP cleaning techniques for use in EUV sources.

Original languageEnglish (US)
Title of host publicationExtreme Ultraviolet (EUV) Lithography VIII
EditorsKenneth A. Goldberg, Eric M. Panning
PublisherSPIE
ISBN (Electronic)9781510607378
DOIs
StatePublished - Jan 1 2017
EventExtreme Ultraviolet (EUV) Lithography VIII 2017 - San Jose, United States
Duration: Feb 27 2017Mar 2 2017

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10143
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherExtreme Ultraviolet (EUV) Lithography VIII 2017
CountryUnited States
CitySan Jose
Period2/27/173/2/17

Fingerprint

Cleaning
Surface Waves
Surface waves
cleaning
surface waves
Plasma
Plasmas
Hydrogen
hydrogen plasma
EUV Source
Ions
reflectance
Reflectivity
dummies
hydrogen ions
Plasma sources
Plasma density
Electron temperature
accumulators
Stainless Steel

Keywords

  • Sn
  • Tin
  • cleaning
  • collector
  • lifetime
  • plasma
  • surface
  • wave

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Panici, G., Qerimi, D., & Ruzic, D. N. (2017). Study of Sn removal by surface wave plasma for source cleaning. In K. A. Goldberg, & E. M. Panning (Eds.), Extreme Ultraviolet (EUV) Lithography VIII [101432I] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10143). SPIE. https://doi.org/10.1117/12.2258065

Study of Sn removal by surface wave plasma for source cleaning. / Panici, Gianluca; Qerimi, Dren; Ruzic, David N.

Extreme Ultraviolet (EUV) Lithography VIII. ed. / Kenneth A. Goldberg; Eric M. Panning. SPIE, 2017. 101432I (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10143).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Panici, G, Qerimi, D & Ruzic, DN 2017, Study of Sn removal by surface wave plasma for source cleaning. in KA Goldberg & EM Panning (eds), Extreme Ultraviolet (EUV) Lithography VIII., 101432I, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10143, SPIE, Extreme Ultraviolet (EUV) Lithography VIII 2017, San Jose, United States, 2/27/17. https://doi.org/10.1117/12.2258065
Panici G, Qerimi D, Ruzic DN. Study of Sn removal by surface wave plasma for source cleaning. In Goldberg KA, Panning EM, editors, Extreme Ultraviolet (EUV) Lithography VIII. SPIE. 2017. 101432I. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.2258065
Panici, Gianluca ; Qerimi, Dren ; Ruzic, David N. / Study of Sn removal by surface wave plasma for source cleaning. Extreme Ultraviolet (EUV) Lithography VIII. editor / Kenneth A. Goldberg ; Eric M. Panning. SPIE, 2017. (Proceedings of SPIE - The International Society for Optical Engineering).
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