Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization

Jean Paul Allain, Osman El-Atwani, Alex Cimaroli, Daniel L. Rokusek, Sami Ortoleva, Anastassiya Suslova

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Ion-beam sputtering (IBS) has been studied as a means for scalable, mask-less nanopatterning of surfaces. Patterning at the nanoscale has been achieved for numerous types of materials including: semiconductors, metals and insulators. Although much work has been focused on tailoring nanopatterning by systematic ion-beam parameter manipulation, limited work has addressed elucidating on the underlying mechanisms for self-organization of multi-component surfaces. In particular there has been little attention to correlate the surface chemistry variation during ion irradiation with the evolution of surface morphology and nanoscale self-organization. Moreover the role of surface impurities on patterning is not well known and characterization during the time-scale of modification remains challenging. This work summarizes an in-situ approach to characterize the evolution of surface chemistry during irradiation and its correlation to surface nanopatterning for a variety of multi-components surfaces. The work highlights the importance and role of surface impurities in nanopatterning of a surface during low-energy ion irradiation. In particular, it shows the importance of irradiation-driven mechanisms in GaSb(100) nanopatterning by low-energy ions and how the study of these systems can be impacted by oxide formation.

Original languageEnglish (US)
Title of host publicationIon Beams - New Applications from Mesoscale to Nanoscale
Pages127-133
Number of pages7
Volume1354
DOIs
StatePublished - 2012
Externally publishedYes
Event2011 MRS Spring Meeting - San Francisco, CA, United States

Other

Other2011 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period4/25/114/29/11

Fingerprint

Edema Disease of Swine
Ion beams
ion beams
Berkelium
Hand Injuries
Adrenergic beta-Agonists
Ion bombardment
Alcohol Drinking
Sputtering
Surface chemistry
Irradiation
Impurities
Semiconductor materials
ion irradiation
sputtering
chemistry
impurities
irradiation
energy
Verbal Reinforcement

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Allain, J. P., El-Atwani, O., Cimaroli, A., Rokusek, D. L., Ortoleva, S., & Suslova, A. (2012). Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization. In Ion Beams - New Applications from Mesoscale to Nanoscale (Vol. 1354, pp. 127-133). DOI: 10.1557/opl.2011.1458

Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization. / Allain, Jean Paul; El-Atwani, Osman; Cimaroli, Alex; Rokusek, Daniel L.; Ortoleva, Sami; Suslova, Anastassiya.

Ion Beams - New Applications from Mesoscale to Nanoscale. Vol. 1354 2012. p. 127-133.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Allain, JP, El-Atwani, O, Cimaroli, A, Rokusek, DL, Ortoleva, S & Suslova, A 2012, Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization. in Ion Beams - New Applications from Mesoscale to Nanoscale. vol. 1354, pp. 127-133, 2011 MRS Spring Meeting, San Francisco, CA, United States, 25-29 April. DOI: 10.1557/opl.2011.1458
Allain JP, El-Atwani O, Cimaroli A, Rokusek DL, Ortoleva S, Suslova A. Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization. In Ion Beams - New Applications from Mesoscale to Nanoscale. Vol. 1354. 2012. p. 127-133. Available from, DOI: 10.1557/opl.2011.1458

Allain, Jean Paul; El-Atwani, Osman; Cimaroli, Alex; Rokusek, Daniel L.; Ortoleva, Sami; Suslova, Anastassiya / Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization.

Ion Beams - New Applications from Mesoscale to Nanoscale. Vol. 1354 2012. p. 127-133.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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