Strong-field effect in nanofabrication on chemically prepared silicon

J. M. Hetrick, X. Zheng, M. H. Nayfeh

Research output: Contribution to journalArticlepeer-review


We investigate the uniformity of scanning tunneling microscope nanofabrication on as-prepared chemically etched silicon. Our results show that continuous fabrication produces isolated nanoscale dots along the motion of the tip rather than uniform lines. These results are discussed with the aid of a self-limiting strong-field effect.

Original languageEnglish (US)
Pages (from-to)4721-4723
Number of pages3
JournalJournal of Applied Physics
Issue number9
StatePublished - 1993

ASJC Scopus subject areas

  • Physics and Astronomy(all)


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