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Stress effects in ferroelectric thin films
L. Lian,
N. R. Sottos
Center for Advanced Study
Materials Science and Engineering
Mechanical Science and Engineering
Aerospace Engineering
Materials Research Lab
Beckman Institute for Advanced Science and Technology
Research output
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peer-review
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Keyphrases
Stress Effect
100%
Electric Field-induced Strain
100%
Ferroelectric Thin Film
100%
Compressive Stress
66%
Polarization Switching
66%
Tensile Residual Stress
66%
Applied Tensile Stress
66%
Clamping Effect
66%
Electric Field (E-field)
33%
Applied Electric Field
33%
Double Beam
33%
Stress Increment
33%
High Field
33%
Hysteresis Loop
33%
Low Field
33%
External Stress
33%
Laser Beams
33%
Mechanical Stress
33%
Tensile Stress
33%
Residual Stress State
33%
Film Surface
33%
Laser Doppler
33%
Heterodyne Interferometer
33%
Electromechanical Response
33%
Uniaxial Compressive
33%
PZT Film
33%
Flexural Vibration
33%
Engineering
Thin Films
100%
Tensile Stress σ
100%
Laser Beam
66%
Compressive Stress
66%
Tensile Residual Stress
66%
Electric Field
33%
Applied Electric Field
33%
Mechanical Stress
33%
Applied Stress
33%
Film Surface
33%
Stress State
33%
Hysteresis Loop
33%
External Stress
33%
Flexural Vibration
33%