Skip to main navigation
Skip to search
Skip to main content
Illinois Experts Home
LOGIN & Help
Home
Profiles
Research units
Research & Scholarship
Datasets
Honors
Press/Media
Activities
Search by expertise, name or affiliation
Stress effects in ferroelectric thin films
L. Lian
,
N. R. Sottos
Center for Advanced Study
Materials Science and Engineering
Mechanical Science and Engineering
Aerospace Engineering
Materials Research Lab
Beckman Institute for Advanced Science and Technology
Research output
:
Contribution to journal
›
Conference article
›
peer-review
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Stress effects in ferroelectric thin films'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Keyphrases
Stress Effect
100%
Electric Field-induced Strain
100%
Ferroelectric Thin Film
100%
Compressive Stress
66%
Polarization Switching
66%
Tensile Residual Stress
66%
Applied Tensile Stress
66%
Clamping Effect
66%
Electric Field (E-field)
33%
Applied Electric Field
33%
Double Beam
33%
Stress Increment
33%
High Field
33%
Hysteresis Loop
33%
Low Field
33%
External Stress
33%
Laser Beams
33%
Mechanical Stress
33%
Tensile Stress
33%
Residual Stress State
33%
Film Surface
33%
Laser Doppler
33%
Heterodyne Interferometer
33%
Electromechanical Response
33%
Uniaxial Compressive
33%
PZT Film
33%
Flexural Vibration
33%
Engineering
Thin Films
100%
Tensile Stress σ
100%
Compressive Stress
66%
Tensile Residual Stress
66%
Laser Beam
66%
Applied Electric Field
33%
Mechanical Stress
33%
Applied Stress
33%
Film Surface
33%
Stress State
33%
Hysteresis Loop
33%
External Stress
33%
Flexural Vibration
33%
Electric Field
33%