Strain Relaxation in CVD Graphene: Wrinkling with Shear Lag

Merijntje S. Bronsgeest, Nedjma Bendiab, Shashank Mathur, Amina Kimouche, Harley T Johnson, Johann Coraux, Pascal Pochet

Research output: Contribution to journalArticle

Abstract

We measure uniaxial strain fields in the vicinity of edges and wrinkles in graphene prepared by chemical vapor deposition (CVD), by combining microscopy techniques and local vibrational characterization. These strain fields have magnitudes of several tenths of a percent and extend across micrometer distances. The nonlinear shear-lag model remarkably captures these strain fields in terms of the graphene-substrate interaction and provides a complete understanding of strain-relieving wrinkles in graphene for any level of graphene-substrate coherency.

Original languageEnglish (US)
Pages (from-to)5098-5104
Number of pages7
JournalNano Letters
Volume15
Issue number8
DOIs
StatePublished - Aug 12 2015

Keywords

  • Raman spectroscopy
  • buckling
  • graphene on cobalt
  • shear lag
  • strain relief
  • uniaxial strain

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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    Bronsgeest, M. S., Bendiab, N., Mathur, S., Kimouche, A., Johnson, H. T., Coraux, J., & Pochet, P. (2015). Strain Relaxation in CVD Graphene: Wrinkling with Shear Lag. Nano Letters, 15(8), 5098-5104. https://doi.org/10.1021/acs.nanolett.5b01246