Spectrally and temporally engineered processing using photoelectrochemistry

Chris Edwards (Inventor), Lynford L Goddard (Inventor), Gang "Logan" Liu (Inventor), Xin Yu (Inventor), Shailendra N Srivastava (Inventor), Catherine Britt Carlson (Inventor), Julianne K Lee (Inventor), Terry Koker (Inventor), Samuel P Washington (Inventor), Lonna D Edwards (Inventor), Kaiyuan Wang (Inventor)

Research output: Patent

Abstract

Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. An electrical potential is applied across the interface of the semiconductor and the solution with a specified temporal profile relative to the temporal profile of the spatial pattern of illumination. Such methods are applied to the fabrication of a photodetector integral with a parabolic reflector, cell size sorting chips, a three-dimensional photonic bandgap chip, a photonic integrated circuit, and an integrated photonic microfluidic circuit.
Original languageEnglish (US)
U.S. patent number10115599
Filing date1/6/16
StatePublished - Oct 30 2018

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