Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography

Yuelin Du, Qiang Ma, Hua Song, James Shiely, Gerard Luk-Pat, Alexander Miloslavsky, Martin D.F. Wong

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Self-aligned double patterning (SADP) lithography is a leading technology for 10nm node Metal layer fabrication. In order to achieve successful decomposition, SADP-compliant design becomes a necessity. Spacer-Is-Dielectric (SID) is the most popular flavor of SADP with higher flexibility in de- sign. This paper makes a careful study on the challenges for SID-compliant detailed routing and proposes a graph model to capture the decomposition violations and SID intrinsic residue issues. Then a negotiated congestion based scheme is adopted to solve the overall routing problem. The proposed SID-compliant detailed routing algorithm simultaneously assigns colors to the routed wires, which provides valuable information guiding SID decomposition. In addition, if one pin has multiple candidate locations, the optimal one will be automatically determined during detailed routing. The decomposability of the conict-free routing layers produced by our detailed router is verified by a commercial SADP decomposition tool.

Original languageEnglish (US)
Title of host publicationProceedings of the 50th Annual Design Automation Conference, DAC 2013
StatePublished - 2013
Event50th Annual Design Automation Conference, DAC 2013 - Austin, TX, United States
Duration: May 29 2013Jun 7 2013

Publication series

NameProceedings - Design Automation Conference
ISSN (Print)0738-100X


Other50th Annual Design Automation Conference, DAC 2013
Country/TerritoryUnited States
CityAustin, TX


  • SADP
  • SID-compliant detailed routing

ASJC Scopus subject areas

  • Computer Science Applications
  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Modeling and Simulation


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