Abstract
Self-aligned double patterning (SADP) lithography is a leading technology for 10nm node Metal layer fabrication. In order to achieve successful decomposition, SADP-compliant design becomes a necessity. Spacer-Is-Dielectric (SID) is the most popular flavor of SADP with higher flexibility in de- sign. This paper makes a careful study on the challenges for SID-compliant detailed routing and proposes a graph model to capture the decomposition violations and SID intrinsic residue issues. Then a negotiated congestion based scheme is adopted to solve the overall routing problem. The proposed SID-compliant detailed routing algorithm simultaneously assigns colors to the routed wires, which provides valuable information guiding SID decomposition. In addition, if one pin has multiple candidate locations, the optimal one will be automatically determined during detailed routing. The decomposability of the conict-free routing layers produced by our detailed router is verified by a commercial SADP decomposition tool.
| Original language | English (US) |
|---|---|
| Title of host publication | Proceedings of the 50th Annual Design Automation Conference, DAC 2013 |
| DOIs | |
| State | Published - Jul 12 2013 |
| Event | 50th Annual Design Automation Conference, DAC 2013 - Austin, TX, United States Duration: May 29 2013 → Jun 7 2013 |
Publication series
| Name | Proceedings - Design Automation Conference |
|---|---|
| ISSN (Print) | 0738-100X |
Other
| Other | 50th Annual Design Automation Conference, DAC 2013 |
|---|---|
| Country | United States |
| City | Austin, TX |
| Period | 5/29/13 → 6/7/13 |
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Keywords
- SADP
- SID-compliant detailed routing
ASJC Scopus subject areas
- Computer Science Applications
- Control and Systems Engineering
- Electrical and Electronic Engineering
- Modeling and Simulation
Cite this
Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography. / Du, Yuelin; Ma, Qiang; Song, Hua; Shiely, James; Luk-Pat, Gerard; Miloslavsky, Alexander; Wong, Martin D F.
Proceedings of the 50th Annual Design Automation Conference, DAC 2013. 2013. 93 (Proceedings - Design Automation Conference).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography
AU - Du, Yuelin
AU - Ma, Qiang
AU - Song, Hua
AU - Shiely, James
AU - Luk-Pat, Gerard
AU - Miloslavsky, Alexander
AU - Wong, Martin D F
PY - 2013/7/12
Y1 - 2013/7/12
N2 - Self-aligned double patterning (SADP) lithography is a leading technology for 10nm node Metal layer fabrication. In order to achieve successful decomposition, SADP-compliant design becomes a necessity. Spacer-Is-Dielectric (SID) is the most popular flavor of SADP with higher flexibility in de- sign. This paper makes a careful study on the challenges for SID-compliant detailed routing and proposes a graph model to capture the decomposition violations and SID intrinsic residue issues. Then a negotiated congestion based scheme is adopted to solve the overall routing problem. The proposed SID-compliant detailed routing algorithm simultaneously assigns colors to the routed wires, which provides valuable information guiding SID decomposition. In addition, if one pin has multiple candidate locations, the optimal one will be automatically determined during detailed routing. The decomposability of the conict-free routing layers produced by our detailed router is verified by a commercial SADP decomposition tool.
AB - Self-aligned double patterning (SADP) lithography is a leading technology for 10nm node Metal layer fabrication. In order to achieve successful decomposition, SADP-compliant design becomes a necessity. Spacer-Is-Dielectric (SID) is the most popular flavor of SADP with higher flexibility in de- sign. This paper makes a careful study on the challenges for SID-compliant detailed routing and proposes a graph model to capture the decomposition violations and SID intrinsic residue issues. Then a negotiated congestion based scheme is adopted to solve the overall routing problem. The proposed SID-compliant detailed routing algorithm simultaneously assigns colors to the routed wires, which provides valuable information guiding SID decomposition. In addition, if one pin has multiple candidate locations, the optimal one will be automatically determined during detailed routing. The decomposability of the conict-free routing layers produced by our detailed router is verified by a commercial SADP decomposition tool.
KW - SADP
KW - SID-compliant detailed routing
UR - http://www.scopus.com/inward/record.url?scp=84879861837&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84879861837&partnerID=8YFLogxK
U2 - 10.1145/2463209.2488848
DO - 10.1145/2463209.2488848
M3 - Conference contribution
AN - SCOPUS:84879861837
SN - 9781450320719
T3 - Proceedings - Design Automation Conference
BT - Proceedings of the 50th Annual Design Automation Conference, DAC 2013
ER -