Soft MEMS

Saunvit D Pandya; Nannan I. Chen; Kee Ryu; Craig J Tucker; Chang Liu; Yingchen Yang; Jonathan Engel

Soft MEMS

Saunvit D Pandya (Inventor), Nannan I. Chen (Inventor), Kee Ryu (Inventor), Craig J Tucker (Inventor), Chang Liu (Inventor), Yingchen Yang (Inventor), Jonathan Engel (Inventor)

Research output: Patent

Abstract

A microscale polymer-based apparatus comprises a substrate formed from a first polymer material and at least one active region integrated with the substrate. The at least one active region is patterned from a second polymer material that is modified to perform at least one function within the at least one active region.

Original language	English (US)
U.S. patent number	8431080
Filing date	6/1/07
State	Published - Apr 30 2013

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title = "Soft MEMS",

abstract = "A microscale polymer-based apparatus comprises a substrate formed from a first polymer material and at least one active region integrated with the substrate. The at least one active region is patterned from a second polymer material that is modified to perform at least one function within the at least one active region.",

author = "Pandya, {Saunvit D} and Chen, {Nannan I.} and Kee Ryu and Tucker, {Craig J} and Chang Liu and Yingchen Yang and Jonathan Engel",

note = "STATEMENT OF GOVERNMENT INTEREST This invention was made with Government assistance under Defense Advanced Research Projects Agency (DARPA) Grant No. FA9550-05-1-0459. The Government has certain rights in this invention.; 8431080",

year = "2013",

month = apr,

day = "30",

language = "English (US)",

type = "Patent",

}

TY - PAT

T1 - Soft MEMS

AU - Pandya, Saunvit D

AU - Chen, Nannan I.

AU - Ryu, Kee

AU - Tucker, Craig J

AU - Liu, Chang

AU - Yang, Yingchen

AU - Engel, Jonathan

N1 - STATEMENT OF GOVERNMENT INTEREST This invention was made with Government assistance under Defense Advanced Research Projects Agency (DARPA) Grant No. FA9550-05-1-0459. The Government has certain rights in this invention.

PY - 2013/4/30

Y1 - 2013/4/30

N2 - A microscale polymer-based apparatus comprises a substrate formed from a first polymer material and at least one active region integrated with the substrate. The at least one active region is patterned from a second polymer material that is modified to perform at least one function within the at least one active region.

AB - A microscale polymer-based apparatus comprises a substrate formed from a first polymer material and at least one active region integrated with the substrate. The at least one active region is patterned from a second polymer material that is modified to perform at least one function within the at least one active region.

M3 - Patent

M1 - 8431080

Y2 - 2007/06/01

ER -

Soft MEMS

Abstract

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