Smoothing agents to enhance nucleation density in thin film chemical vapor deposition

Shaista Babar (Inventor), John R Abelson (Inventor), Gregory S Girolami (Inventor), Navneet Kumar (Inventor)

Research output: Patent

Abstract

The present invention provides methods for making structures, including nanosized and microsized thin film structures that exhibit a high degree of smoothness useful for applications in microelectronics. Deposition processing of the invention utilize smoothing agents capable of selectively adjusting the relative rates of processes involved in thin film formation and growth to access enhanced nucleation densities resulting in smooth thin film structures, including ultrathin (e.g., <10 nm) smooth films.
Original languageEnglish (US)
U.S. patent number8846146
StatePublished - Sep 30 2014

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